LH

Lindsey Hall

TI Texas Instruments: 29 patents #346 of 12,488Top 3%
IBM: 3 patents #26,272 of 70,183Top 40%
SS Stmicroelectronics Sa: 3 patents #449 of 1,676Top 30%
Globalfoundries: 1 patents #2,221 of 4,424Top 55%
MI Masco Corporation Of Indiana: 1 patents #151 of 235Top 65%
Overall (All Time): #103,485 of 4,157,543Top 3%
34
Patents All Time

Issued Patents All Time

Showing 25 most recent of 34 patents

Patent #TitleCo-InventorsDate
9252050 Method to improve semiconductor surfaces and polishing Michael Hatzistergos, Ahmet S. Ozcan, Filippos Papadatos, Yiyi Wang 2016-02-02
9230857 Method to improve semiconductor surfaces and polishing Michael Hatzistergos, Ahmet S. Ozcan, Filippos Papadatos, Yiyi Wang 2016-01-05
8944105 Capacitive sensing apparatus and method for faucets Robert W. Rodenbeck, David M. Burke, Timothy J. Ensor, Paul D. Koottungal 2015-02-03
8940634 Overlapping contacts for semiconductor device Brett H. Engel, David F. Hilscher, Randolph F. Knarr, Steven R. Soss, Jin Z. Wallner 2015-01-27
8119470 Mitigation of gate to contact capacitance in CMOS flow Shashank S. Ekbote, Borna J. Obradovic, Craig Huffman, Ajith Varghese 2012-02-21
8053252 Mitigation of edge degradation in ferroelectric memory devices through plasma etch clean Kezhakkedath R. Udayakumar, Francis G. Celii, Scott R. Summerfelt 2011-11-08
7799582 Mitigation of edge degradation in ferroelectric memory devices through plasma etch clean Kezhakkedath R. Udayakumar, Francis G. Celii, Scott R. Summerfelt 2010-09-21
7723199 Method for cleaning post-etch noble metal residues Yaw S. Obeng, Kezhakkedath R. Udayakumar, Scott R. Summerfelt, Sanjeev Aggarwal, Francis G. Celii +2 more 2010-05-25
7572698 Mitigation of edge degradation in ferroelectric memory devices through plasma etch clean Kezhakkedath R. Udayakumar, Francis G. Celii, Scott R. Summerfelt 2009-08-11
7517779 Recessed drain extensions in transistor device 2009-04-14
7448395 Process method to facilitate silicidation Jiong-Ping Lu, Freidoon Mehrad, Vivian Liu, Clint Montgomery, Scott Francis Johnson 2008-11-11
7422967 Method for manufacturing a semiconductor device containing metal silicide regions Juanita DeLoach, Lance Robertson, Jiong-Ping Lu, Donald Miles 2008-09-09
7422968 Method for manufacturing a semiconductor device having silicided regions Jiong-Ping Lu, Clint Montgomery, Donald Miles, Duofeng Yue, Thomas D. Bonifiield 2008-09-09
7371691 Silicon recess improvement through improved post implant resist removal and cleans Trace Hurd, Deborah J. Riley 2008-05-13
7341933 Method for manufacturing a silicided gate electrode using a buffer layer Shaofeng Yu, Haowen Bu, Jiong-Ping Lu 2008-03-11
7252773 Clean for high density capacitors 2007-08-07
7253086 Recessed drain extensions in transistor device 2007-08-07
7253049 Method for fabricating dual work function metal gates Jiong-Ping Lu, Shaofeng Yu, Haowen Bu, Mark Visokay 2007-08-07
7244654 Drive current improvement from recessed SiGe incorporation close to gate PR Chidambaram, Douglas T. Grider, Brian Smith, Haowen Bu 2007-07-17
7228865 FRAM capacitor stack clean Scott R. Summerfelt 2007-06-12
7220600 Ferroelectric capacitor stack etch cleaning methods Scott R. Summerfelt, Kezhakkedath R. Udayakumar, Theodore S. Moise 2007-05-22
7217626 Transistor fabrication methods using dual sidewall spacers Haowen Bu, PR Chidambaram, Rajesh Khamankar 2007-05-15
7157358 Method for using a wet etch to manufacturing a semiconductor device having a silicided gate electrode and a method for manufacturing an integrated circuit including the same Haowen Bu, Shaofeng Yu 2007-01-02
7153706 Ferroelectric capacitor having a substantially planar dielectric layer and a method of manufacture therefor Sanjeev Aggarwal, Kelly Taylor, Satyavolu Srinivas Papa Rao 2006-12-26
7060579 Increased drive current by isotropic recess etch PR Chidambaram, Haowen Bu 2006-06-13