Issued Patents All Time
Showing 1–7 of 7 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 9640396 | Spin-on spacer materials for double- and triple-patterning lithography | Qin Lin, Rama Puligadda, James Claypool, Douglas J. Guerrero | 2017-05-02 |
| 8877430 | Methods of producing structures using a developer-soluble layer with multilayer technology | Carlton Ashley Washburn, James E. Lamb, III, Justin Lee Furse, Heping Wang | 2014-11-04 |
| 7320927 | In situ hardmask pullback using an in situ plasma resist trim process | Juanita DeLoach | 2008-01-22 |
| 7300883 | Method for patterning sub-lithographic features in semiconductor manufacturing | Francis G. Celii, James Walter Blatchford, Robert J. Kraft | 2007-11-27 |
| 7244654 | Drive current improvement from recessed SiGe incorporation close to gate | PR Chidambaram, Douglas T. Grider, Haowen Bu, Lindsey Hall | 2007-07-17 |
| 7199011 | Method to reduce transistor gate to source/drain overlap capacitance by incorporation of carbon | Majid Mansoori, Alwin Tsao, Antonio Luis Pacheco Rotondaro | 2007-04-03 |
| 6808942 | Method for controlling a critical dimension (CD) in an etch process | Nital S. Patel, Jeffrey Stephan Hodges, Dale R. Burrows, Yu-Lun Lin | 2004-10-26 |