Issued Patents All Time
Showing 1–21 of 21 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 11972948 | Adhesion layers for EUV lithography | Andrea M. Chacko, Vandana Krishnamurthy, Yichen Liang, Hao-Chun Lee, Stephen Grannemann | 2024-04-30 |
| 11361967 | Underlayers for EUV lithography | Yichen Liang, Andrea M. Chacko, Yubao Wang | 2022-06-14 |
| 9640396 | Spin-on spacer materials for double- and triple-patterning lithography | Qin Lin, Rama Puligadda, James Claypool, Brian Smith | 2017-05-02 |
| 9638999 | Dual-layer light-sensitive developer-soluble bottom anti-reflective coatings for 193-nm lithography | Jim D. Meador, Ramil Marcelo L. Mercado | 2017-05-02 |
| 9249013 | Silicon hardmask layer for directed self-assembly | Yubao Wang, Mary Ann Hockey, Vandana Krishnamurthy, Robert Christian Cox | 2016-02-02 |
| 9123541 | Highly etch-resistant polymer block for use in block copolymers for directed self-assembly | Kui Xu, Mary Ann Hockey | 2015-09-01 |
| 9110372 | Anti-reflective coatings using vinyl ether crosslinkers | Robert Christian Cox, Marc Weimer | 2015-08-18 |
| 8968989 | Assist layers for EUV lithography | Tantiboro Ouattara, Carlton Ashley Washburn, Vandana Krishnamurthy, Aline Collin | 2015-03-03 |
| 8257910 | Underlayers for EUV lithography | Hao Xu, Vandana Krishnamurthy | 2012-09-04 |
| 8206893 | Photoimageable branched polymer | Hao Xu, Ramil Marcelo L. Mercado, Jim D. Meador | 2012-06-26 |
| 7939244 | Photosensitive hardmask for microlithography | Hao Xu, Ramil Marcelo L. Mercado | 2011-05-10 |
| 7914974 | Anti-reflective imaging layer for multiple patterning process | Ramil Marcelo L. Mercado | 2011-03-29 |
| 7601483 | Anti-reflective coatings using vinyl ether crosslinkers | Robert Christian Cox, Marc Weimer | 2009-10-13 |
| 7132219 | Polymeric antireflective coatings deposited by plasma enhanced chemical vapor deposition | Ram Sabnis, Wu-Sheng Shih | 2006-11-07 |
| 7108958 | Photosensitive bottom anti-reflective coatings | — | 2006-09-19 |
| 6936405 | Organic polymeric antireflective coatings deposited by chemical vapor deposition | Ram Sabnis, Terry Brewer, Mary J. Spencer | 2005-08-30 |
| 6900000 | Organic polymeric antireflective coatings deposited by chemical vapor deposition | Ram Sabnis, Terry Brewer, Mary J. Spencer | 2005-05-31 |
| 6869747 | Organic polymeric antireflective coatings deposited by chemical vapor deposition | Ram Sabnis, Terry Brewer, Mary J. Spencer | 2005-03-22 |
| 6852473 | Anti-reflective coating conformality control | William Roberts, Marlene Strobl, Paul A. Williams, Alice F. Martin | 2005-02-08 |
| 6303270 | Highly plasma etch-resistant photoresist composition containing a photosensitive polymeric titania precursor | Tony D. Flaim, Michelle Fowler, William J. James, Vladimir Petrovsky, Harlan U. Anderson | 2001-10-16 |
| 5919599 | Thermosetting anti-reflective coatings at deep ultraviolet | Jim D. Meador, Xie Shao, Vandana Krishnamurthy | 1999-07-06 |