JV

Jean R. Vatus

Applied Materials: 9 patents #1,414 of 7,310Top 20%
CI Crystal Solar, Incorporated: 2 patents #9 of 13Top 70%
ST Svagos Technik: 1 patents #4 of 7Top 60%
TH Thomson-Csf: 1 patents #796 of 2,054Top 40%
Overall (All Time): #345,533 of 4,157,543Top 9%
14
Patents All Time

Issued Patents All Time

Showing 1–14 of 14 patents

Patent #TitleCo-InventorsDate
11041253 Silicon wafers by epitaxial deposition Visweswaren Sivaramakrishnan, Tirunelveli S. Ravi, Andrzej Kaszuba, Quoc Truong 2021-06-22
9982363 Silicon wafers by epitaxial deposition Visweswaren Sivaramakrishnan, Tirunelveli S. Ravi, Andrzej Kaszuba, Quoc Truong 2018-05-29
9255346 Silicon wafers by epitaxial deposition Visweswaren Sivaramakrishnan, Tirunelveli S. Ravi, Andrzej Kaszuba, Quoc Truong 2016-02-09
9058988 Methods for depositing layers having reduced interfacial contamination Jinsong Tang, Yihwan Kim, Satheesh Kuppurao, Errol Antonio C. Sanchez 2015-06-16
8951351 Wafer processing hardware for epitaxial deposition with reduced backside deposition and defects Kailash Kiran Patalay, Craig Metzner 2015-02-10
8747560 System and method for pedestal adjustment Richard O. Collins, Kailash Kiran Patalay, Zhepeng CONG 2014-06-10
8512472 Method and apparatus to enhance process gas temperature in a CVD reactor Kailash Kiran Patalay 2013-08-20
8441640 Non-contact substrate support position sensing system and corresponding adjustments Kailash Kiran Patalay, Richard O. Collins, Zhepeng CONG 2013-05-14
8418982 Self supporting table base 2013-04-16
8398777 System and method for pedestal adjustment Richard O. Collins, Kailash Kiran Patalay, Zhepeng CONG 2013-03-19
7964038 Apparatus for improved azimuthal thermal uniformity of a substrate Kailash Kiran Patalay, Dean Berlin 2011-06-21
7651948 Pre-cleaning of substrates in epitaxy chambers Yihwan Kim, Lori D. Washington, Arkadii V. Samoilov, Ali Zojaji 2010-01-26
6876442 Method of calibrating and using a semiconductor processing system David K. Carlson, Arkadii V. Samoilov, Lance A. Scudder, Paul B. Comita, Annie Karpati 2005-04-05
4742026 Method for the selective dry etching of layers of III-V group semiconductive materials Jean-Baptiste Chevrier 1988-05-03