Issued Patents All Time
Showing 25 most recent of 37 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 7115344 | Photomask and pattern forming method employing the same | Norio Hasegawa, Katsuya Hayano | 2006-10-03 |
| 6964832 | Semiconductor device and manufacturing method thereof | Akemi Moniwa, Jiro Yamamoto, Hiroshi Fukuda | 2005-11-15 |
| 6845497 | Method for fabrication of patterns and semiconductor devices | Hiroshi Fukuda | 2005-01-18 |
| 6733953 | Photomask and pattern forming method employing the same | Norio Hasegawa, Katsuya Hayano | 2004-05-11 |
| 6709880 | Semiconductor device and a manufacturing method of the same | Jiro Yamamoto, Tsuneo Terasawa, Tosiyuki Yamamoto | 2004-03-23 |
| 6586341 | Method of manufacturing semiconductor device | Akemi Moniwa, Hiroshi Fukuda | 2003-07-01 |
| 6518548 | Substrate temperature control system and method for controlling temperature of substrate | Masakazu Sugaya, Yutaka Kaneko, Masafumi Kanetomo, Shigeki Hirasawa, Tomoji Watanabe +2 more | 2003-02-11 |
| 6497992 | Process for manufacturing semiconductor integrated circuit device | Takashi Yunogami, Shunji Sasabe, Kazuyuki Suko, Jun Abe, Takao Kumihashi | 2002-12-24 |
| 6394797 | Substrate temperature control system and method for controlling temperature of substrate | Masakazu Sugaya, Yutaka Kaneko, Masafumi Kanetomo, Shigeki Hirasawa, Tomoji Watanabe +2 more | 2002-05-28 |
| 6383718 | Photomask and pattern forming method employing the same | Norio Hasegawa, Katsuya Hayano | 2002-05-07 |
| 6258513 | Photomask and pattern forming method employing the same | Norio Hasegawa, Katsuya Hayano | 2001-07-10 |
| 6087074 | Photomask and pattern forming method employing the same | Norio Hasegawa, Katsuya Hayano | 2000-07-11 |
| 6057081 | Process for manufacturing semiconductor integrated circuit device | Takashi Yunogami, Shunji Sasabe, Kazuyuki Suko, Jun Abe, Takao Kumihashi | 2000-05-02 |
| 6013398 | Photomask and pattern forming method employing the same | Norio Hasegawa, Katsuya Hayano | 2000-01-11 |
| 5851703 | Photomask and pattern forming method employing the same | Norio Hasegawa, Katsuya Hayano | 1998-12-22 |
| 5757409 | Exposure method and pattern data preparation system therefor, pattern data preparation method and mask as well as exposure apparatus | Yoshihiko Okamoto, Haruo Yoda, Ikuo Takada, Yukinobu Shibata, Akira Hirakawa +2 more | 1998-05-26 |
| 5656400 | Photomask and pattern forming method employing the same | Norio Hasegawa, Katsuya Hayano | 1997-08-12 |
| 5589270 | Processed substrate obtained by a process for effecting suppression of electrification | Yasunori Suzuki, Hideki Tomozawa, Ryuma Takashi, Yoshihiro Saida, Yoshiaki Ikenoue | 1996-12-31 |
| 5578421 | Photomask and pattern forming method employing the same | Norio Hasegawa, Katsuya Hayano | 1996-11-26 |
| 5557314 | Exposure method and pattern data preparation system therefor, pattern data preparation method and mask as well as exposure apparatus | Yoshihiko Okamoto, Haruo Yoda, Ikuo Takada, Yukinobu Shibata, Akira Hirakawa +2 more | 1996-09-17 |
| 5441849 | Method of forming pattern and making semiconductor device using radiation-induced conductive resin bottom resist layer | Hiroshi Shiraishi, Takumi Ueno, Hajime Hayakawa, Asao Isobe | 1995-08-15 |
| 5437893 | Method for suppression of electrification | Yasunori Suzuki, Hideki Tomozawa, Ryuma Takashi, Yoshihiro Saida, Yoshiaki Ikenoue | 1995-08-01 |
| 5429896 | Photomask and pattern forming method employing the same | Norio Hasegawa, Katsuya Hayano | 1995-07-04 |
| 5350485 | High-resolution lithography and semiconductor device manufacturing method | Hiroshi Shiraishi, Takashi Soga, Toshio Sakamizu, Nobuaki Hayashi | 1994-09-27 |
| 5334845 | Charged beam exposure method and apparatus as well as aperture stop and production method thereof | Hiroaki Wakabayashi, Yoshinori Nakayama, Shinji Okazaki | 1994-08-02 |