DH

David V. Horak

IBM: 11 patents #9,995 of 70,183Top 15%
TL Tokyo Electron Limited: 4 patents #1,723 of 5,567Top 35%
Overall (All Time): #424,181 of 4,157,543Top 15%
12
Patents All Time

Issued Patents All Time

Patent #TitleCo-InventorsDate
8038834 Method and system for controlling radical distribution Merritt Funk, Eric J. Strang, Lee Chen 2011-10-18
7718030 Method and system for controlling radical distribution Merritt Funk, Eric J. Strang, Lee Chen 2010-05-18
7585614 Sub-lithographic imaging techniques and processes Toshiharu Furukawa, Mark C. Hakey, Steven J. Holmes, Charles W. Koburger, III, Peter H. Mitchell +2 more 2009-09-08
7502660 Feature dimension deviation correction system, method and program product Wesley C. Natzle, Merritt Funk, Kevin Lally, Daniel Prager 2009-03-10
7289864 Feature dimension deviation correction system, method and program product Wesley C. Natzle, Merritt Funk, Kevin Lally, Daniel Prager 2007-10-30
7027125 System and apparatus for photolithography Mark C. Hakey, Charles W. Koburger, III, Peter H. Mitchell 2006-04-11
6387596 Method of forming resist images by periodic pattern removal Daniel C. Cole, Edward W. Conrad, Randy W. Mann, Paul W. Pastel, Jed H. Rankin +1 more 2002-05-14
6342323 Alignment methodology for lithography William H. Ma, Toshiharu Furukawa, Steven J. Holmes, Mark C. Hakey 2002-01-29
6338921 Mask with linewidth compensation and method of making same James A. Bruce, Randy W. Mann, Jed H. Rankin, Andrew J. Watts 2002-01-15
6268908 Micro adjustable illumination aperture Orest Bula, Daniel C. Cole, Edward W. Conrad, Jed H. Rankin 2001-07-31
6014422 Method for varying x-ray hybrid resist space dimensions Diane C. Boyd, Toshiharu Furukawa, Mark C. Hakey, Steven J. Holmes, William H. Ma +1 more 2000-01-11
5173452 Process for the vapor deposition of polysilanes photoresists David M. Dobuzinsky, Mark C. Hakey, Steven J. Holmes 1992-12-22