Issued Patents All Time
Showing 25 most recent of 52 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 10423081 | Reticle cooling by non-uniform gas flow | Thomas Venturino, Geoffrey Alan Schultz, Daniel Nathan Burbank, Santiago E. DELPUERTO, Herman Vogel +3 more | 2019-09-24 |
| 9977351 | Patterning device support, lithographic apparatus, and method of controlling patterning device temperature | Earl William Ebert, Johannes Onvlee, Samir Nayfeh, Mark Josef Schuster, Peter A. Delmastro +5 more | 2018-05-22 |
| 9766557 | Patterning device support, lithographic apparatus, and method of controlling patterning device temperature | Earl William Ebert, Johannes Onvlee, Samir Nayfeh, Mark Josef Schuster, Peter A. Delmastro +5 more | 2017-09-19 |
| 9632433 | Patterning device support, lithographic apparatus, and method of controlling patterning device temperature | Earl William Ebert, Johannes Onvlee, Samir Nayfeh, Mark Josef Schuster, Peter A. Delmastro +5 more | 2017-04-25 |
| 9632434 | Reticle cooling system in a lithographic apparatus | Earl William Ebert, Johannes Onvlee, Samir Nayfeh, Mark Josef Schuster, Peter A. Delmastro +6 more | 2017-04-25 |
| RE42650 | Fluid gauge proximity sensor and method of operating same using a modulated fluid flow | Earl William Ebert, Joseph H. Lyons | 2011-08-30 |
| 7797985 | Method and system for operating an air gauge at programmable or constant standoff | Boguslaw Gajdeczko | 2010-09-21 |
| 7437911 | Method and system for operating an air gauge at programmable or constant standoff | Boguslaw Gajdeczko | 2008-10-21 |
| 7389155 | Method and system for improved trajectory planning and execution | Todd Bednarek | 2008-06-17 |
| 7372548 | Levitated reticle-masking blade stage | Frederick Carter, Stephen Roux | 2008-05-13 |
| 7369214 | Lithographic apparatus and device manufacturing method utilizing a metrology system with sensors | — | 2008-05-06 |
| 7359037 | Drive for reticle-masking blade stage | Frederick Carter, Stephen Roux | 2008-04-15 |
| 7292308 | System and method for patterning a flexible substrate in a lithography tool | Stanley G. Janik | 2007-11-06 |
| 7196775 | Patterned mask holding device and method using two holding systems | — | 2007-03-27 |
| 7176593 | Actuator coil cooling system | — | 2007-02-13 |
| 7164463 | Lithographic tool with dual isolation system and method for configuring the same | Peter Kochersperger | 2007-01-16 |
| 7158213 | Lithographic tool with dual isolation system and method for configuring the same | Peter Kochersperger | 2007-01-02 |
| 7134321 | Fluid gauge proximity sensor and method of operating same using a modulated fluid flow | Earl William Ebert, Joseph H. Lyons | 2006-11-14 |
| 7124624 | High-resolution gas gauge proximity sensor | Boguslaw Gajdeczko, Kenneth M. Bogursky, Willy M. Sander, Kevin J. Violette | 2006-10-24 |
| 7105836 | Method and apparatus for cooling a reticle during lithographic exposure | Santiago del Puerto, Andrew W. McCullough, Stephen Roux, Joost Jeroen Ottens | 2006-09-12 |
| 7075623 | Flexure-supported split reaction mass | Mark Williams | 2006-07-11 |
| 7053990 | System to increase throughput in a dual substrate stage double exposure lithography system | Jos de Klerk | 2006-05-30 |
| 7050156 | Method to increase throughput in a dual substrate stage double exposure lithography system | Jos de Klerk | 2006-05-23 |
| 7042554 | Removable reticle window and support frame using magnetic force | — | 2006-05-09 |
| 7021121 | Gas gauge proximity sensor with a modulated gas flow | Earl William Ebert, Joseph H. Lyons | 2006-04-04 |