Issued Patents All Time
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 9690213 | Linear Stage for reflective electron beam lithography | Upendra Ummethala, Layton Hale, Joshua Randall Clyne, Samir Nayfeh, Joseph A. Di Regolo +1 more | 2017-06-27 |
| 8976336 | Shear-layer chuck for lithographic apparatus | Samir Nayfeh, Justin Matthew Verdirame | 2015-03-10 |
| 8786832 | Shear-layer chuck for lithographic apparatus | Samir Nayfeh, Justin Matthew Verdirame | 2014-07-22 |
| 8779635 | Arrangement of reticle positioning device for actinic inspection of EUV reticles | Pradeep Subrahmanyan, Samir Nayfeh | 2014-07-15 |
| 8724115 | Linear stage and metrology architecture for reflective electron beam lithography | Upendra Ummethala, Layton Hale, Josh Clyne, Samir Nayfeh, Joseph A. DiRegolo +1 more | 2014-05-13 |
| 7075623 | Flexure-supported split reaction mass | Daniel N. Galburt | 2006-07-11 |