| 7951616 |
Process for wafer temperature verification in etch tools |
Keren Jacobs Kanarik, James Rogers, Bi-Ming Yen |
2011-05-31 |
| 7682985 |
Dual doped polysilicon and silicon germanium etch |
Yoko Y. Adams, Yoshinori Miyamoto, Yousun Taylor |
2010-03-23 |
| 7667281 |
Method for hard mask CD trim |
Shibu Gangadharan, Chris Lee, Alan J. Miller |
2010-02-23 |
| 7425277 |
Method for hard mask CD trim |
Shibu Gangadharan, Chris Lee, Alan J. Miller |
2008-09-16 |
| RE38097 |
Chemical vapor deposition system with a plasma chamber having separate process gas and cleaning gas injection ports |
David Trussell, Felix Kozakevich |
2003-04-29 |
| 6303044 |
Method of and apparatus for detecting and controlling in situ cleaning time of vacuum processing chambers |
Felix Kozakevich |
2001-10-16 |
| 6071573 |
Process for precoating plasma CVD reactors |
Felix Kozakevich |
2000-06-06 |
| 6016766 |
Microwave plasma processor |
David R. Pirkle, John Daugherty, Michael Giarratano, Felix Kozakevich |
2000-01-25 |
| 6017414 |
Method of and apparatus for detecting and controlling in situ cleaning time of vacuum processing chambers |
Felix Kozakevich |
2000-01-25 |
| 5988187 |
Chemical vapor deposition system with a plasma chamber having separate process gas and cleaning gas injection ports |
David Trussell, Felix Kozakevich |
1999-11-23 |
| 5911833 |
Method of in-situ cleaning of a chuck within a plasma chamber |
Dean R. Denison, William Harshbarger, Anwar Husain, Felix Kozakevich, David Trussell |
1999-06-15 |
