Issued Patents All Time
Showing 25 most recent of 40 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 12180589 | Showerhead for process tool | — | 2024-12-31 |
| 11834745 | Spatial atomic layer deposition | — | 2023-12-05 |
| 11823910 | Systems and methods for improving planarity using selective atomic layer etching (ALE) | David L. O'Meara, Masanobu Igeta | 2023-11-21 |
| 11781220 | Multiple zone gas injection for control of gas phase radicals | — | 2023-10-10 |
| 11469147 | Gas phase production of radicals for dielectrics | — | 2022-10-11 |
| 11417526 | Multiple patterning processes | David L. O'Meara, Eric Chih-Fang Liu, Jodi Grzeskowiak, Anton J. deVilliers, Akiteru Ko | 2022-08-16 |
| 11274370 | Multiple zone gas injection for control of gas phase radicals | — | 2022-03-15 |
| 11225716 | Internally cooled multi-hole injectors for delivery of process chemicals | Melvin Verbaas | 2022-01-18 |
| 9831099 | Method and apparatus for multi-film deposition and etching in a batch processing system | David L. O'Meara | 2017-11-28 |
| 8673725 | Multilayer sidewall spacer for seam protection of a patterned structure | David L. O'Meara, Aelan Mosden, Pao-Hwa Chou, Richard A. Conti | 2014-03-18 |
| 8664102 | Dual sidewall spacer for seam protection of a patterned structure | David L. O'Meara, Aelan Mosden, Pao-Hwa Chou, Richard A. Conti | 2014-03-04 |
| 8465592 | Film deposition apparatus | Hitoshi Kato, Manabu Honma | 2013-06-18 |
| 8466045 | Method of forming strained epitaxial carbon-doped silicon films | John Gumpher, Seungho Oh | 2013-06-18 |
| 8465591 | Film deposition apparatus | Hitoshi Kato, Manabu Honma | 2013-06-18 |
| 8263474 | Reduced defect silicon or silicon germanium deposition in micro-features | John Gumpher, Allen J. Leith, Seungho Oh | 2012-09-11 |
| 8043432 | Atomic layer deposition systems and methods | — | 2011-10-25 |
| 7994070 | Low-temperature dielectric film formation by chemical vapor deposition | Kimberly Gay Reid | 2011-08-09 |
| 7910494 | Thermal processing furnace, gas delivery system therefor, and methods for delivering a process gas thereto | Eric J. Malstrom | 2011-03-22 |
| 7816278 | In-situ hybrid deposition of high dielectric constant films using atomic layer deposition and chemical vapor deposition | Kimberly Gay Reid | 2010-10-19 |
| 7776763 | In-situ formation of oxidized aluminum nitride films | Kimberly Gay Reid | 2010-08-17 |
| 7737051 | Silicon germanium surface layer for high-k dielectric integration | Pradip K. Roy, Sanjeev Kaushal, Allen J. Leith, Seungho Oh, Raymond Joe | 2010-06-15 |
| 7659214 | Method for growing an oxynitride film on a substrate | Kimberly Gay Reid | 2010-02-09 |
| 7635655 | Method for replacing a nitrous oxide based oxidation process with a nitric oxide based oxidation process for substrate processing | — | 2009-12-22 |
| 7632354 | Thermal processing system with improved process gas flow and method for injecting a process gas into a thermal processing system | Shinji Asari, Meenakshisundaram Gandhi | 2009-12-15 |
| 7604841 | Method for extending time between chamber cleaning processes | Raymond Joe, John Gumpher | 2009-10-20 |