EK

Erdem Kaltalioglu

Infineon Technologies Ag: 46 patents #88 of 7,486Top 2%
IBM: 26 patents #4,008 of 70,183Top 6%
Globalfoundries: 12 patents #298 of 4,424Top 7%
UM United Microelectronics: 2 patents #1,942 of 4,560Top 45%
📍 Newburgh, NY: #4 of 198 inventorsTop 3%
🗺 New York: #982 of 115,490 inventorsTop 1%
Overall (All Time): #26,497 of 4,157,543Top 1%
74
Patents All Time

Issued Patents All Time

Showing 51–74 of 74 patents

Patent #TitleCo-InventorsDate
7494915 Back end interconnect with a shaped interface Lawrence A. Clevenger, Andrew P. Cowley, Timothy J. Dalton, Mark Hoinkis, Steffen K. Kaldor +8 more 2009-02-24
7436016 MIM capacitor with a cap layer over the conductive plates Hans-Joachim Barth, Petra Felsner, Gerald Friese 2008-10-14
7368804 Method and apparatus of stress relief in semiconductor structures Mark Hoinkis, Matthias Hierlemann, Gerald Friese, Andy Cowley, Dennis J. Warner 2008-05-06
7332812 Memory card with connecting portions for connection to an adapter Klaus Herold 2008-02-19
7307346 Final passivation scheme for integrated circuits Christian Pils 2007-12-11
7268383 Capacitor and method of manufacturing a capacitor Petra Felsner, Thomas Schafbauer, Uwe Kerst, Hans-Joachim Barth 2007-09-11
7241681 Bilayered metal hardmasks for use in dual damascene etch schemes Kaushik A. Kumar, Lawrence A. Clevenger, Timothy J. Dalton, Douglas C. La Tulipe, Jr., Andy Cowley +5 more 2007-07-10
7201634 Polishing methods and apparatus Markus Naujok 2007-04-10
7125792 Dual damascene structure and method Kaushik A. Kumar, Douglas C. La Tulipe, Jr., Timothy J. Dalton, Larry Clevenger, Andy Cowley +1 more 2006-10-24
7122462 Back end interconnect with a shaped interface Lawrence A. Clevenger, Andrew P. Cowley, Timothy J. Dalton, Mark Hoinkis, Steffen K. Kaldor +8 more 2006-10-17
7091612 Dual damascene structure and method Kaushik A. Kumar, Timothy J. Dalton, Larry Clevenger, Andy Cowley, Douglas C. La Tulipe, Jr. +5 more 2006-08-15
7060619 Reduction of the shear stress in copper via's in organic interlayer dielectric material Andy Cowley, Mark Hoinkis, Michael Stetter 2006-06-13
7052621 Bilayered metal hardmasks for use in Dual Damascene etch schemes Kaushik A. Kumar, Lawrence A. Clevenger, Timothy J. Dalton, Douglas C. La Tulipe, Jr., Andy Cowley +5 more 2006-05-30
6960835 Stress-relief layer for semiconductor applications Hans-Joachim Barth, Mark Hoinkis, Gerald Friese, Pak K. Leung 2005-11-01
6949442 Methods of forming MIM capacitors Hans-Joachim Barth, Petra Felsner, Gerald Friese 2005-09-27
6914320 Bilayer HDP CVD/PE CVD cap in advanced BEOL interconnect structures and method thereof Tze-Chiang Chen, Brett H. Engel, John A. Fitzsimmons, Terence L. Kane, Naftall E. Lustig +5 more 2005-07-05
6887783 Bilayer HDP CVD/PE CVD cap in advance BEOL interconnect structures and method thereof Tze-Chiang Chen, Brett H. Engel, John A. Fitzsimmons, Terence L. Kane, Naftall E. Lustig +5 more 2005-05-03
6806182 Method for eliminating via resistance shift in organic ILD Darryl D. Restaino, Shahab Siddiqui, Delores Bennett, Chih-Chih Liu, Hsueh-Chung Chen +3 more 2004-10-19
6806579 Robust via structure and method Andy Cowley, Michael Stetter 2004-10-19
6730982 FBEOL process for Cu metallizations free from Al-wirebond pads Hans-Joachim Barth, Petra Felsner, Gerald Friese 2004-05-04
6638851 Dual hardmask single damascene integration scheme in an organic low k ILD Andy Cowley, Michael Stetter 2003-10-28
6613664 Barbed vias for electrical and mechanical connection between conductive layers in semiconductor devices Hans-Joachin Barth 2003-09-02
6387754 Method of forming an on-chip decoupling capacitor with bottom hardmask Timothy J. Dalton, Andrew P. Cowley, Peter A. Emmi, Vincent J. McGahay 2002-05-14
6278147 On-chip decoupling capacitor with bottom hardmask Timothy J. Dalton, Andrew P. Cowley, Peter A. Emmi, Vincent J. McGahay 2001-08-21