Issued Patents All Time
Showing 401–425 of 462 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 8963248 | Semiconductor device having SSOI substrate with relaxed tensile stress | Ali Khakifirooz, Pranita Kerber, Alexander Reznicek | 2015-02-24 |
| 8951870 | Forming strained and relaxed silicon and silicon germanium fins on the same wafer | Bruce B. Doris, Ali Khakifirooz, Tenko Yamashita, Chun-Chen Yeh | 2015-02-10 |
| 8946802 | Method of eDRAM DT strap formation in FinFET device structure | Sivananda K. Kanakasabapathy, Tenko Yamashita, Chun-Chen Yeb | 2015-02-03 |
| 8946063 | Semiconductor device having SSOI substrate with relaxed tensile stress | Ali Khakifirooz, Pranita Kerber, Alexander Reznicek | 2015-02-03 |
| 8946791 | Finfet with reduced parasitic capacitance | Effendi Leobandung, Tenko Yamashita | 2015-02-03 |
| 8941161 | Semiconductor device including finFET and diode having reduced defects in depletion region | Tenko Yamashita | 2015-01-27 |
| 8940602 | Self-aligned structure for bulk FinFET | Effendi Leobandung, Tenko Yamashita, Chun-Chen Yeh | 2015-01-27 |
| 8933559 | Carbon nanotube structures for enhancement of thermal dissipation from semiconductor modules | Toshiharu Furukawa, Mark C. Hakey, Steven J. Holmes, Charles W. Koburger, III, Krishna V. Singh | 2015-01-13 |
| 8927365 | Method of eDRAM DT strap formation in FinFET device structure | Sivananda K. Kanakasabapathy, Tenko Yamashita, Chun-Chen Yeb | 2015-01-06 |
| 8926805 | Method and apparatus for electroplating on SOI and bulk semiconductor wafers | Eduard A. Cartier, Hariklia Deligianni, Rajarao Jammy, Vamsi K. Paruchuri | 2015-01-06 |
| 8912612 | Silicon nitride gate encapsulation by implantation | Sanjay C. Mehta, Tenko Yamashita, Chun-Chen Yeh | 2014-12-16 |
| 8912056 | Dual epitaxial integration for FinFETS | Effendi Leobandung, Xinhui Wang, Tenko Yamashita | 2014-12-16 |
| 8906759 | Silicon nitride gate encapsulation by implantation | Sanjay C. Mehta, Tenko Yamashita, Chun-Chen Yeh | 2014-12-09 |
| 8900934 | FinFET devices containing merged epitaxial Fin-containing contact regions | Thomas N. Adam, Jinghong Li, Chung-Hsun Lin, Sebastian Naczas, Alexander Reznicek +1 more | 2014-12-02 |
| 8901664 | High-K/metal gate CMOS finFET with improved pFET threshold voltage | Kangguo Cheng, Bruce B. Doris, Johnathan E. Faltermeier, Ali Khakifirooz | 2014-12-02 |
| 8896063 | FinFET devices containing merged epitaxial Fin-containing contact regions | Thomas N. Adam, Jinghong Li, Chung-Hsun Lin, Sebastian Naczas, Alexander Reznicek +1 more | 2014-11-25 |
| 8889540 | Stress memorization in RMG FinFets | Qing Liu, Tenko Yamashita, Chun-Chen Yeh | 2014-11-18 |
| 8883578 | Strained silicon nFET and silicon germanium pFET on same wafer | Chun-Chen Yeh, Tenko Yamashita | 2014-11-11 |
| 8877615 | Methods of manufacturing finFET devices | David V. Horak, Hemanth Jagannathan, Charles W. Koburger, III | 2014-11-04 |
| 8871626 | FinFET with vertical silicide structure | Chung-Hsun Lin, Tenko Yamashita, Chun-Chen Yeh | 2014-10-28 |
| 8860112 | finFET eDRAM strap connection structure | Effendi Leobandung, Tenko Yamashita, Chun-Chen Yeh | 2014-10-14 |
| 8847323 | finFET devices | David V. Horak, Hemanth Jagannathan, Charles W. Koburger, III | 2014-09-30 |
| 8841178 | Strained silicon nFET and silicon germanium pFET on same wafer | Chun-Chen Yeh, Tenko Yamashita | 2014-09-23 |
| 8841716 | Retrograde substrate for deep trench capacitors | Wilfried E. Haensch, Effendi Leobandung, Tenko Yamashita, Chun-Chen Yeh | 2014-09-23 |
| 8835249 | Retrograde substrate for deep trench capacitors | Wilfried E. Haensch, Effendi Leobandung, Tenko Yamashita, Chun-Chen Yeh | 2014-09-16 |