Issued Patents All Time
Showing 451–462 of 462 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 8368146 | FinFET devices | David V. Horak, Hemanth Jagannathan, Charles W. Koburger, III | 2013-02-05 |
| 8303791 | Apparatus and method for electrochemical processing of thin films on resistive substrates | John M. Cotte, Hariklia Deligianni, Matteo Flotta | 2012-11-06 |
| 8299605 | Carbon nanotube structures for enhancement of thermal dissipation from semiconductor modules | Toshiharu Furukawa, Mark C. Hakey, Steven J. Holmes, Charles W. Koburger, III, Krishna V. Singh | 2012-10-30 |
| 8288276 | Method of forming an interconnect structure including a metallic interfacial layer located at a bottom via portion | Chih-Chao Yang, William R. Tonti, Keith Kwong Hon Wong | 2012-10-16 |
| 8242578 | Anti-fuse device structure and electroplating circuit structure and method | Toshiharu Furukawa, William R. Tonti | 2012-08-14 |
| 8043966 | Method for monitoring patterning integrity of etched openings and forming conductive structures with the openings | Toshiharu Furukawa, William R. Tonti | 2011-10-25 |
| 7993999 | High-K/metal gate CMOS finFET with improved pFET threshold voltage | Kangguo Cheng, Bruce B. Doris, Johnathan E. Faltermeier, Ali Khakifirooz | 2011-08-09 |
| 7944006 | Metal gate electrode stabilization by alloying | Hariklia Deligianni, Rajarao Jammy, Vamsi K. Paruchuri, Lubomyr T. Romankiw | 2011-05-17 |
| 7935621 | Anti-fuse device structure and electroplating circuit structure and method | Toshiharu Furukawa, William R. Tonti | 2011-05-03 |
| 7868410 | Gate stack engineering by electrochemical processing utilizing through-gate-dielectric current flow | Philippe M. Vereecken, Cyril Cabral, Jr., Emanuel I. Cooper, Hariklia Deligianni, Martin M. Frank +4 more | 2011-01-11 |
| 7776680 | Complementary metal oxide semiconductor device with an electroplated metal replacement gate | John M. Cotte, Hariklia Deligianni, Toshiharu Furukawa, Vamsi K. Paruchuri, William R. Tonti | 2010-08-17 |
| 7368045 | Gate stack engineering by electrochemical processing utilizing through-gate-dielectric current flow | Philippe M. Vereecken, Cyril Cabral, Jr., Emanuel I. Cooper, Hariklia Deligianni, Martin M. Frank +4 more | 2008-05-06 |