Issued Patents All Time
Showing 76–94 of 94 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 8409867 | Ultra low-power CMOS based bio-sensor circuit | Aditya Bansal | 2013-04-02 |
| 8304836 | Structure and method to obtain EOT scaled dielectric stacks | Hemanth Jagannathan, Takashi Ando, Lisa F. Edge, Changhwan Choi, Paul C. Jamison +2 more | 2012-11-06 |
| 8288237 | TiC as a thermally stable p-metal carbide on high k SiO2 gate stacks | Alessandro C. Callegari, Michael A. Gribelyuk, Dianne L. Lacey, Fenton R. Feeney, Katherine L. Saenger | 2012-10-16 |
| 8153514 | Method of forming metal/high-κ gate stacks with high mobility | Wanda Andreoni, Alessandro C. Callegari, Eduard A. Cartier, Alessandro Curioni, Christopher P. D'Emic +9 more | 2012-04-10 |
| 8052931 | Ultra low-power CMOS based bio-sensor circuit | Aditya Bansal | 2011-11-08 |
| 7776701 | Metal oxynitride as a pFET material | Alessandro C. Callegari, Michael A. Gribelyuk, Vijay Narayanan, Vamsi K. Paruchuri | 2010-08-17 |
| 7667277 | TiC as a thermally stable p-metal carbide on high k SiO2 gate stacks | Alessandro C. Callegari, Michael A. Gribelyuk, Dianne L. Lacey, Fenton R. McFeely, Katherine L. Saenger | 2010-02-23 |
| 7611979 | Metal gates with low charge trapping and enhanced dielectric reliability characteristics for high-k gate dielectric stacks | Alessandro C. Callegari, Michael P. Chudzik, Barry P. Linder, Renee T. Mo, Vijay Narayanan +2 more | 2009-11-03 |
| 7566938 | Deposition of hafnium oxide and/or zirconium oxide and fabrication of passivated electronic structures | Cyril Cabral, Jr., Alessandro C. Callegari, Michael A. Gribelyuk, Paul C. Jamison, Dianne L. Lacey +4 more | 2009-07-28 |
| 7521346 | Method of forming HfSiN metal for n-FET applications | Alessandro C. Callegari, Martin M. Frank, Rajarao Jammy, Dianne L. Lacey, Fenton R. McFeely | 2009-04-21 |
| 7436034 | Metal oxynitride as a pFET material | Alessandro C. Callegari, Michael A. Gribelyuk, Vijay Narayanan, Vamsi K. Paruchuri | 2008-10-14 |
| 7235440 | Formation of ultra-thin oxide layers by self-limiting interfacial oxidation | David L. O'Meara, Cory Wajda, Anthony Dip, Michael Toeller, Toshihara Furukawa +6 more | 2007-06-26 |
| 7202186 | Method of forming uniform ultra-thin oxynitride layers | David L. O'Meara, Cory Wajda, Anthony Dip, Michael Toeller, Toshihara Furukawa +6 more | 2007-04-10 |
| 7115959 | Method of forming metal/high-k gate stacks with high mobility | Wanda Andreoni, Alessandro C. Callegari, Eduard A. Cartier, Alessandro Curioni, Christopher P. D'Emic +9 more | 2006-10-03 |
| 6982230 | Deposition of hafnium oxide and/or zirconium oxide and fabrication of passivated electronic structures | Cyril Cabral, Jr., Alessandro C. Callegari, Michael A. Gribelyuk, Paul C. Jamison, Dianne L. Lacey +4 more | 2006-01-03 |
| 6974779 | Interfacial oxidation process for high-k gate dielectric process integration | David L. O'Meara, Cory Wajda, Tsuyoshi Takahashi, Alessandro C. Callegari, Kristen Scheer +1 more | 2005-12-13 |
| 6413819 | Memory device and method for using prefabricated isolated storage elements | Ramachandran Muralidhar, Bich-Yen Nguyen, Sucharita Madhukar, Daniel T. Pham, Michael A. Sadd +1 more | 2002-07-02 |
| 6297095 | Memory device that includes passivated nanoclusters and method for manufacture | Ramachandran Muralidhar, Chitra Subramanian, Sucharita Madhukar, Bruce E. White, Michael A. Sadd +2 more | 2001-10-02 |
| 5750419 | Process for forming a semiconductor device having a ferroelectric capacitor | — | 1998-05-12 |