Issued Patents All Time
Showing 26–50 of 68 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 10622248 | Tunable hardmask for overlayer metrology contrast | Ekmini Anuja De Silva, Nelson Felix, Indira Seshadri | 2020-04-14 |
| 10580652 | Alternating hardmasks for tight-pitch line formation | John C. Arnold, Anuja E. DeSilva, Nelson Felix, Chi-Chun Liu, Yann Mignot | 2020-03-03 |
| 10535529 | Semiconductor fin length variability control | Praveen Joseph, Ekmini Anuja De Silva, Eric R. Miller | 2020-01-14 |
| 10461172 | Vertical transistors having improved gate length control using uniformly deposited spacers | Christopher J. Waskiewicz, Hemanth Jagannathan, Yann Mignot | 2019-10-29 |
| 10410875 | Alternating hardmasks for tight-pitch line formation | Sean D. Burns, Nelson Felix, Chi-Chun Liu, Yann Mignot | 2019-09-10 |
| 10361129 | Self-aligned double patterning formed fincut | Yann Mignot, Christopher J. Waskiewicz, Hemanth Jagannathan, Eric R. Miller, Indira Seshadri | 2019-07-23 |
| 10312103 | Alternating hardmasks for tight-pitch line formation | Sean D. Burns, Nelson Felix, Chi-Chun Liu, Yann Mignot | 2019-06-04 |
| 10312346 | Vertical transistor with variable gate length | Brent A. Anderson, Bassem M. Hamieh, Junli Wang | 2019-06-04 |
| 10304744 | Inverse tone direct print EUV lithography enabled by selective material deposition | Praveen Joseph, Ekmini Anuja De Silva, Fee Li Lie, Yann Mignot, Indira Seshadri | 2019-05-28 |
| 10304689 | Margin for fin cut using self-aligned triple patterning | Gauri Karve, Fee Li Lie, Eric R. Miller, John R. Sporre, Sean Teehan | 2019-05-28 |
| 10249753 | Gate cut on a vertical field effect transistor with a defined-width inorganic mask | Brent A. Anderson, Sivananda K. Kanakasabapathy, Jeffrey C. Shearer, John R. Sporre, Junli Wang | 2019-04-02 |
| 10242952 | Registration mark formation during sidewall image transfer process | David J. Conklin, Allen H. Gabor, Sivananda K. Kanakasabapathy, Byeong Y. Kim, Fee Li Lie | 2019-03-26 |
| 10211319 | Stress retention in fins of fin field-effect transistors | Sivananda K. Kanakasabapathy, Gauri Karve, Juntao Li, Fee Li Lie, John R. Sporre | 2019-02-19 |
| 10211321 | Stress retention in fins of fin field-effect transistors | Sivananda K. Kanakasabapathy, Gauri Karve, Juntao Li, Fee Li Lie, John R. Sporre | 2019-02-19 |
| 10176997 | Direct gate patterning for vertical transport field effect transistor | Ekmini Anuja De Silva, Indira Seshadri, Wenyu Xu | 2019-01-08 |
| 10121785 | Pitch scalable active area patterning structure and process for multi-channel fin FET technologies | Sivananda K. Kanakasabapathy, Fee Li Lie, Eric R. Miller | 2018-11-06 |
| 10121853 | Structure and process to tuck fin tips self-aligned to gates | Bruce B. Doris, Hong He, Sivananda K. Kanakasabapathy, Gauri Karve, Fee Li Lie +2 more | 2018-11-06 |
| 10121852 | Structure and process to tuck fin tips self-aligned to gates | Bruce B. Doris, Hong He, Sivananda K. Kanakasabapathy, Gauri Karve, Fee Li Lie +2 more | 2018-11-06 |
| 10103022 | Alternating hardmasks for tight-pitch line formation | John C. Arnold, Anuja E. DeSilva, Nelson Felix, Chi-Chun Liu, Yann Mignot | 2018-10-16 |
| 10043760 | Registration mark formation during sidewall image transfer process | David J. Conklin, Allen H. Gabor, Sivananda K. Kanakasabapathy, Byeong Y. Kim, Fee Li Lie | 2018-08-07 |
| 10032680 | Strained finFET device fabrication | Bruce B. Doris, Hong He, Sivananda K. Kanakasabapathy, Gauri Karve, Fee Li Lie | 2018-07-24 |
| 9997369 | Margin for fin cut using self-aligned triple patterning | Gauri Karve, Fee Li Lie, Eric R. Miller, John R. Sporre, Sean Teehan | 2018-06-12 |
| 9917019 | Strained FinFET device fabrication | Bruce B. Doris, Hong He, Sivananda K. Kanakasabapathy, Gauri Karve, Fee Li Lie | 2018-03-13 |
| 9882048 | Gate cut on a vertical field effect transistor with a defined-width inorganic mask | Brent A. Anderson, Sivananda K. Kanakasabapathy, Jeffrey C. Shearer, John R. Sporre, Junli Wang | 2018-01-30 |
| 9876074 | Structure and process to tuck fin tips self-aligned to gates | Bruce B. Doris, Hong He, Sivananda K. Kanakasabapathy, Gauri Karve, Fee Li Lie +2 more | 2018-01-23 |