SH

Steven J. Holmes

IBM: 329 patents #61 of 70,183Top 1%
Globalfoundries: 6 patents #578 of 4,424Top 15%
FS Freeescale Semiconductor: 2 patents #1,335 of 3,767Top 40%
HL Highlight Games Limited: 2 patents #3 of 7Top 45%
📍 Ossining, NY: #1 of 613 inventorsTop 1%
🗺 New York: #46 of 115,490 inventorsTop 1%
Overall (All Time): #943 of 4,157,543Top 1%
341
Patents All Time

Issued Patents All Time

Showing 176–200 of 341 patents

Patent #TitleCo-InventorsDate
7374793 Methods and structures for promoting stable synthesis of carbon nanotubes Toshiharu Furukawa, Mark C. Hakey, David Vaclav Hotak, Charles W. Koburger, III, Peter H. Mitchell +1 more 2008-05-20
7368712 Y-shaped carbon nanotubes as AFM probe for analyzing substrates with angled topography Carol Boye, Toshiharu Furukawa, Mark C. Hakey, David V. Horak, Charles W. Koburger, III 2008-05-06
7362412 Method and apparatus for cleaning a semiconductor substrate in an immersion lithography system Mark C. Hakey, Toshiharu Furukawa, David V. Horak 2008-04-22
7358120 Silicon-on-insulator (SOI) read only memory (ROM) array and method of making a SOI ROM Toshiharu Furukawa, Mark C. Hakey, David V. Horak, Charles W. Koburger, III, Jack A. Mandelman 2008-04-15
7358140 Pattern density control using edge printing processes Toshiharu Furukawa, Mark C. Hakey, David V. Horak, Charles W. Koburger, III 2008-04-15
7351666 Layout and process to contact sub-lithographic structures Toshiharu Furukawa, Mark C. Hakey, David V. Horak, Charles W. Koburger, III, Chung H. Lam 2008-04-01
7351348 Evaporation control using coating Daniel A. Corliss, Dario L. Goldfarb, Kurt R. Kimmel, Michael Lercel 2008-04-01
7351648 Methods for forming uniform lithographic features Toshiharu Furukawa, Mark C. Hakey, David V. Horak, Charles W. Koburger, III, Chung H. Lam 2008-04-01
7352030 Semiconductor devices with buried isolation regions Toshiharu Furukawa, Mark C. Hakey, David V. Horak, Charles W. Koburger, III 2008-04-01
7352607 Non-volatile switching and memory devices using vertical nanotubes Toshiharu Furukawa, Mark C. Hakey, David V. Horak, Charles W. Koburger, III 2008-04-01
7348634 Shallow trench isolation formation Toshiharu Furukawa, Mark C. Hakey, David V. Horak, Charles W. Koburger, III 2008-03-25
7345370 Wiring patterns formed by selective metal plating Toshiharu Furukawa, Mark C. Hakey, David V. Horak, Charles W. Koburger, III 2008-03-18
7329613 Structure and method for forming semiconductor wiring levels using atomic layer deposition Toshiharu Furukawa, David V. Horak, Charles W. Koburger, III 2008-02-12
7329567 Vertical field effect transistors incorporating semiconducting nanotubes grown in a spacer-defined passage Toshiharu Furukawa, Mark C. Hakey, David V. Horak, Peter H. Mitchell, Larry Nesbit 2008-02-12
7317226 Patterned SOI by oxygen implantation and annealing Keith E. Fogel, Mark C. Hakey, Devendra K. Sadana, Ghavam G. Shahidi 2008-01-08
7288814 Selective post-doping of gate structures by means of selective oxide growth Anthony I. Chou, Toshiharu Furukawa 2007-10-30
7282423 Method of forming fet with T-shaped gate Toshiharu Furukawa, Mark C. Hakey, David V. Horak, Edward J. Nowak 2007-10-16
7273794 Shallow trench isolation fill by liquid phase deposition of SiO2 Mark C. Hakey, David V. Horak, Charles W. Koburger, III, Peter H. Mitchell, Larry Nesbit 2007-09-25
7271079 Method of doping a gate electrode of a field effect transistor Toshiharu Furukawa, Mark C. Hakey, David V. Horak, Charles W. Koburger, III 2007-09-18
7265013 Sidewall image transfer (SIT) technologies Toshiharu Furukawa, Mark C. Hakey, David V. Horak, Charles W. Koburger, III, Kirk D. Peterson 2007-09-04
7264415 Methods of forming alternating phase shift masks having improved phase-shift tolerance Toshiharu Furukawa, Mark C. Hakey, David V. Horak, Charles W. Koburger, III, Peter H. Mitchell +1 more 2007-09-04
7256415 Memory device and method of manufacturing the device by simultaneously conditioning transition metal oxide layers in a plurality of memory cells Toshijaru Furukawa, Mark C. Hakey, David V. Horak, Charles W. Koburger, III, Chung H. Lam +1 more 2007-08-14
7256114 Process for oxide cap formation in semiconductor manufacturing Toshiharu Furukawa, Mark C. Hakey, David V. Horak, Charles W. Koburger, III, Larry Nesbit 2007-08-14
7250347 Double-gate FETs (Field Effect Transistors) Toshiharu Furukawa, Mark C. Hakey, David V. Horak, Charles W. Koburger, III, Peter H. Mitchell +1 more 2007-07-31
7239371 Density-aware dynamic leveling in scanning exposure systems Bernhard R. Liegl, Colin J. Brodsky, Scott Bukofsky 2007-07-03