Issued Patents All Time
Showing 151–175 of 341 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 7557023 | Implantation of gate regions in semiconductor device fabrication | Toshiharu Furukawa, Mark C. Hakey, David V. Horak, Charles W. Koburger, III | 2009-07-07 |
| 7545041 | Techniques for patterning features in semiconductor devices | Scott D. Allen, Katherina Babich, Arpan Mahorowala, Dirk Pfeiffer, Richard Wise | 2009-06-09 |
| 7541608 | Memory device and method of manufacturing the device by simultaneously conditioning transition metal oxide layers in a plurality of memory cells | Toshijaru Furukawa, Mark C. Hakey, David V. Horak, Charles W. Koburger, III, Chung H. Lam +1 more | 2009-06-02 |
| 7528494 | Accessible chip stack and process of manufacturing thereof | Toshiharu Furukawa, Mark C. Hakey, David V. Horak, Charles W. Koburger, III | 2009-05-05 |
| 7525156 | Shallow trench isolation fill by liquid phase deposition of SiO2 | Mark C. Hakey, David V. Horak, Charles W. Koburger, III, Peter H. Mitchell, Larry Nesbit | 2009-04-28 |
| 7521808 | Wiring paterns formed by selective metal plating | Toshiharu Furukawa, Mark C. Hakey, David V. Horak, Charles W. Koburger, III | 2009-04-21 |
| 7517716 | Method of forming optical sensor that includes three pairs of electrodes formed at different depths in a semiconductor substrate | Toshiharu Furukawa, David V. Horak, Charles W. Koburger, III | 2009-04-14 |
| 7510939 | Microelectronic structure by selective deposition | Toshiharu Furukawa, David V. Horak, Charles W. Koburger, III | 2009-03-31 |
| 7505110 | Micro-electro-mechanical valves and pumps | Toshiharu Furukawa, Mark C. Hakey, David V. Horak, Charles W. Koburger, III | 2009-03-17 |
| 7504314 | Method for fabricating oxygen-implanted silicon on insulation type semiconductor and semiconductor formed therefrom | Toshiharu Furukawa, Mark C. Hakey, David V. Horak, Charles W. Koburger, III, Larry Nesbit | 2009-03-17 |
| 7495743 | Immersion optical lithography system having protective optical coating | Toshiharu Furukawa, Charles W. Koburger, III, Naim Moumen | 2009-02-24 |
| 7492046 | Electric fuses using CNTs (carbon nanotubes) | Toshiharu Furukawa, Mark C. Hakey, David V. Horak, Charles W. Koburger, III | 2009-02-17 |
| 7491631 | Method of doping a gate electrode of a field effect transistor | Toshiharu Furukawa, Mark C. Hakey, David V. Horak, Charles W. Koburger, III | 2009-02-17 |
| 7483285 | Memory devices using carbon nanotube (CNT) technologies | Toshiharu Furukawa, Mark C. Hakey, David V. Horak, Charles W. Koburger, III | 2009-01-27 |
| 7459013 | Chemical and particulate filters containing chemically modified carbon nanotube structures | Mark C. Hakey, David V. Horak, James G. Ryan | 2008-12-02 |
| 7439144 | CMOS gate structures fabricated by selective oxidation | Bruce B. Doris, Toshiharu Furukawa, Mark C. Hakey, David V. Horak, Charles W. Koburger, III | 2008-10-21 |
| 7439081 | Method for making integrated circuit chip utilizing oriented carbon nanotube conductive layers | Toshiharu Furukawa, Mark C. Hakey, David V. Horak, Charles Koburger III, Peter H. Mitchell | 2008-10-21 |
| 7402194 | Carbon nanotubes as low voltage field emission sources for particle precipitators | Toshiharu Furukawa, Mark C. Hakey, David V. Horak, Charles W. Koburger, III | 2008-07-22 |
| 7393779 | Shrinking contact apertures through LPD oxide | Toshiharu Furukawa, Mark C. Hakey, David V. Horak, Charles W. Koburger, III, Larry Nesbit | 2008-07-01 |
| 7387974 | Methods for providing gate conductors on semiconductors and semiconductors formed thereby | Toshiharu Furukawa, Charles W. Koburger, III, David V. Horak, Mark C. Hakey | 2008-06-17 |
| 7385839 | Memory devices using carbon nanotube (CNT) technologies | Toshiharu Furukawa, Mark C. Hakey, David V. Horak, Charles W. Koburger, III | 2008-06-10 |
| 7385673 | Immersion lithography with equalized pressure on at least projection optics component and wafer | Toshiharu Furukawa, Mark C. Hakey, David V. Horak, Peter H. Mitchell | 2008-06-10 |
| 7381610 | Semiconductor transistors with contact holes close to gates | Toshiharu Furukawa, Mark C. Hakey, David V. Horak, Charles W. Koburger, III, William R. Tonti | 2008-06-03 |
| 7378717 | Semiconductor optical sensors | Toshiharu Furukawa, David V. Horak, Charles W. Koburger, III | 2008-05-27 |
| 7378678 | Memory device and method of manufacturing the device by simultaneously conditioning transition metal oxide layers in a plurality of memory cells | Toshijaru Furukawa, Mark C. Hakey, David V. Horak, Charles W. Koburger, III, Chung H. Lam +1 more | 2008-05-27 |