Issued Patents All Time
Showing 226–246 of 246 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 6710361 | Multi-beam hybrid solenoid lens electron beam system | Hans C. Pfeiffer, Maris A. Sturans | 2004-03-23 |
| 6596999 | High performance source for electron beam projection lithography | Steven D. Golladay, Rodney A. Kendall, Shinichi Kojima, Werner Stickel | 2003-07-22 |
| 6573514 | Method for aligning electron beam projection lithography tool | Jon E. Lieberman, Christopher F. Robinson | 2003-06-03 |
| 6486953 | Accurate real-time landing angle and telecentricity measurement in lithographic systems | John G. Hartley, James D. Rockrohr, Maris A. Sturans | 2002-11-26 |
| 6483117 | Symmetric blanking for high stability in electron beam exposure systems | Clay S. Clement, Rodney A. Kendall, Werner Stickel | 2002-11-19 |
| 6476400 | Method of adjusting a lithography system to enhance image quality | Christopher F. Robinson, Scott A. Messick | 2002-11-05 |
| 6456019 | Real time measurement of leakage current in high voltage electron guns | Samuel K. Doran | 2002-09-24 |
| 6437352 | Charged particle beam projection lithography with variable beam shaping | — | 2002-08-20 |
| 6429607 | Constant power dynamic focus coil | Maris A. Sturans | 2002-08-06 |
| 6414313 | Multiple numerical aperture electron beam projection lithography system | Rodney A. Kendall, David J. Pinckney | 2002-07-02 |
| 6353231 | Pinhole detector for electron intensity distribution | Steven D. Golladay, Rodney A. Kendall, Carl E. Bohnenkamp | 2002-03-05 |
| 6262425 | Curvilinear axis set-up for charged particle lithography | Paul F. Petric, Christopher F. Robinson, James D. Rockrohr | 2001-07-17 |
| 6262427 | Variable transmission reticle for charged particle beam lithography tool | — | 2001-07-17 |
| 6218671 | On-line dynamic corrections adjustment method | Steven D. Golladay, Chris Robinson, James D. Rockrohr | 2001-04-17 |
| 6188071 | Feedback method for increasing stability of electron beams | Scott A. Messick, Chris Robinson, James D. Rockrohr | 2001-02-13 |
| 6180947 | Multi-element deflection aberration correction for electron beam lithography | Werner Stickel, Hans C. Pfeiffer, Steven D. Golladay | 2001-01-30 |
| 6090528 | Spot-to-spot stitching in electron beam lithography utilizing square aperture with serrated edge | John G. Hartley | 2000-07-18 |
| 5838013 | Method for monitoring resist charging in a charged particle system | Rainer Butsch, William A. Enichen, John G. Hartley | 1998-11-17 |
| 5747814 | Method for centering a lens in a charged-particle system | Paul F. Petric | 1998-05-05 |
| 5742065 | Heater for membrane mask in an electron-beam lithography system | Rodney A. Kendall, David J. Pinckney, James L. Speidell | 1998-04-21 |
| 5650628 | Simultaneous deflections in charged-particle beams | Donald F. Haire, Paul F. Petric, James D. Rockrohr | 1997-07-22 |