| 9991156 |
Self-aligned quadruple patterning (SAQP) for routing layouts including multi-track jogs |
Sean D. Burns, Lawrence A. Clevenger, Matthew E. Colburn, Sivananda K. Kanakasabapathy, Yann Mignot +2 more |
2018-06-05 |
| 9978560 |
System and method for performing nano beam diffraction analysis |
Marc A. Bergendahl, James J. Demarest, Roger QUON, Christopher J. Waskiewicz |
2018-05-22 |
| 9972533 |
Aligning conductive vias with trenches |
Sean D. Burns, Lawrence A. Clevenger, Matthew E. Colburn, Sivananda K. Kanakasabapathy, Yann Mignot +2 more |
2018-05-15 |
| 9966337 |
Fully aligned via with integrated air gaps |
Benjamin D. Briggs, Lawrence A. Clevenger, Huai Huang, Michael Rizzolo, Hosadurga Shobha |
2018-05-08 |
| 9966305 |
Ion flow barrier structure for interconnect metallization |
James J. Demarest, James J. Kelly, Koichi Motoyama, Oscar van der Straten |
2018-05-08 |
| 9960117 |
Air gap semiconductor structure with selective cap bilayer |
Stephen M. Gates, Elbert E. Huang, Dimitri Kioussis, Deepika Priyadarshini |
2018-05-01 |
| 9934970 |
Self aligned pattern formation post spacer etchback in tight pitch configurations |
Sean D. Burns, Lawrence A. Clevenger, Matthew E. Colburn, Nelson Felix, Sivananda K. Kanakasabapathy +2 more |
2018-04-03 |
| 9929088 |
Airgap protection layer for via alignment |
Benjamin D. Briggs, Lawrence A. Clevenger, Michael Rizzolo |
2018-03-27 |
| 9911651 |
Skip-vias bypassing a metallization level at minimum pitch |
Benjamin D. Briggs, Lawrence A. Clevenger, Bartlet H. DeProspo, Huai Huang, Michael Rizzolo |
2018-03-06 |
| 9911647 |
Self aligned conductive lines |
Sean D. Burns, Lawrence A. Clevenger, Anuja E. DeSilva, Nelson Felix, Sivananda K. Kanakasabapathy +3 more |
2018-03-06 |
| 9905513 |
Selective blocking boundary placement for circuit locations requiring electromigration short-length |
Benjamin D. Briggs, Elbert E. Huang, Joe Lee |
2018-02-27 |
| 9899256 |
Self-aligned airgaps with conductive lines and vias |
Benjamin D. Briggs, Lawrence A. Clevenger, Bartlet H. DeProspo, Huai Huang, Michael Rizzolo |
2018-02-20 |
| 9899338 |
Structure and fabrication method for enhanced mechanical strength crack stop |
Benjamin D. Briggs, Lawrence A. Clevenger, Bartlet H. DeProspo, Huai Huang, Michael Rizzolo |
2018-02-20 |
| 9852946 |
Self aligned conductive lines |
Sean D. Burns, Lawrence A. Clevenger, Matthew E. Colburn, Sivananda K. Kanakasabapathy, Yann Mignot +2 more |
2017-12-26 |
| 9837355 |
Method for maximizing air gap in back end of the line interconnect through via landing modification |
Benjamin D. Briggs, Lawrence A. Clevenger, Michael Rizzolo |
2017-12-05 |
| 9837485 |
High-density MIM capacitors |
Benjamin D. Briggs, Lawrence A. Clevenger, Bartlet H. DeProspo, Huai Huang, Michael Rizzolo |
2017-12-05 |
| 9837305 |
Forming deep airgaps without flop over |
Benjamin D. Briggs, Lawrence A. Clevenger, Bartlet H. DeProspo, Huai Huang, Michael Rizzolo |
2017-12-05 |
| 9824982 |
Structure and fabrication method for enhanced mechanical strength crack stop |
Benjamin D. Briggs, Lawrence A. Clevenger, Bartlet H. DeProspo, Huai Huang, Michael Rizzolo |
2017-11-21 |
| 9793193 |
Air gap and air spacer pinch off |
Griselda Bonilla, Elbert E. Huang, Son V. Nguyen, Takeshi Nogami, Deepika Priyadarshini |
2017-10-17 |
| 9793206 |
Heterogeneous metallization using solid diffusion removal of metal interconnects |
Benjamin D. Briggs, Lawrence A. Clevenger, Bartlet H. DeProspo, Huai Huang, Michael Rizzolo |
2017-10-17 |
| 9793213 |
Ion flow barrier structure for interconnect metallization |
James J. Demarest, James J. Kelly, Koichi Motoyama, Oscar van der Straten |
2017-10-17 |
| 9786554 |
Self aligned conductive lines |
Sean D. Burns, Lawrence A. Clevenger, Anuja E. DeSilva, Nelson Felix, Sivananda K. Kanakasabapathy +3 more |
2017-10-10 |
| 9786760 |
Air gap and air spacer pinch off |
Griselda Bonilla, Elbert E. Huang, Son V. Nguyen, Takeshi Nogami, Deepika Priyadarshini |
2017-10-10 |
| 9780027 |
Hybrid airgap structure with oxide liner |
Marc A. Bergendahl, James J. Demarest, Christopher J. Waskiewicz |
2017-10-03 |
| 9779944 |
Method and structure for cut material selection |
Sean D. Burns, Lawrence A. Clevenger, Matthew E. Colburn, Nelson Felix, Sivananda K. Kanakasabapathy +3 more |
2017-10-03 |
