Issued Patents All Time
Showing 26–50 of 52 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 6046425 | Plasma processing apparatus having insulator disposed on inner surface of plasma generating chamber | Tetsunori Kaji, Takashi Fujii, Motohiko Yoshigai, Masaharu Nishiumi | 2000-04-04 |
| 6036816 | Apparatus for processing a sample having a metal laminate | Masayuki Kojima, Yoshimi Torii, Michimasa Hunabashi, Kazuyuki Suko, Takashi Yamada +5 more | 2000-03-14 |
| 5952245 | Method for processing samples | Yoshimi Torii, Kazuo Nojiri, Yoshiaki Sato, Ryooji Fukuyama, Hironobu Kawahara | 1999-09-14 |
| 5914051 | Microwave plasma processing method and apparatus | Saburo Kanai, Kazuaki Ichihashi, Seiichi Watanabe, Makoto Nawata | 1999-06-22 |
| 5900162 | Plasma etching method and apparatus | Hironobu Kawahara, Yoshiaki Sato, Ryooji Fukuyama | 1999-05-04 |
| 5868854 | Method and apparatus for processing samples | Masayuki Kojima, Yoshimi Torii, Michimasa Hunabashi, Kazuyuki Suko, Takashi Yamada +5 more | 1999-02-09 |
| 5855726 | Vacuum processing apparatus and semiconductor manufacturing line using the same | Minoru Soraoka, Ken Yoshioka | 1999-01-05 |
| 5811316 | Method of forming teos oxide and silicon nitride passivation layer on aluminum wiring | Jun Sugiura, Osamu Tsuchiya, Makoto Ogasawara, Fumio Ootsuka, Kazuyoshi Torii +22 more | 1998-09-22 |
| 5804033 | Microwave plasma processing method and apparatus | Saburo Kanai, Kazuaki Ichihashi, Seiichi Watanabe, Makoto Nawata, Muneo Furuse +1 more | 1998-09-08 |
| 5785807 | Microwave plasma processing method and apparatus | Saburo Kanai, Kazuaki Ichihashi, Seiichi Watanabe, Makoto Nawata | 1998-07-28 |
| 5780882 | Semiconductor integrated circuit device, process for fabricating the same, and apparatus for fabricating the same | Jun Sugiura, Osamu Tsuchiya, Makoto Ogasawara, Fumio Ootsuka, Kazuyoshi Torii +22 more | 1998-07-14 |
| 5739589 | Semiconductor integrated circuit device process for fabricating the same and apparatus for fabricating the same | Jun Sugiura, Osamu Tsuchiya, Makoto Ogasawara, Fumio Ootsuka, Kazuyoshi Torii +22 more | 1998-04-14 |
| 5646489 | Plasma generator with mode restricting means | Yutaka Kakehi, Keizo Suzuki, Kazuo Nojiri, Hiromichi Enami, Tetsunori Kaji +2 more | 1997-07-08 |
| 5557147 | Semiconductor integrated circuit device, process for fabricating the same, and apparatus for fabricating the same | Jun Sugiura, Osamu Tsuchiya, Makoto Ogasawara, Fumio Ootsuka, Kazuyoshi Torii +22 more | 1996-09-17 |
| 5520771 | Microwave plasma processing apparatus | Saburo Kanai, Kazuaki Ichihashi, Seiichi Watanabe, Makoto Nawata | 1996-05-28 |
| 5433789 | Methods and apparatus for generating plasma, and semiconductor processing methods using mode restricted microwaves | Yutaka Kakehi, Keizo Suzuki, Kazuo Nojiri, Hiromichi Enami, Tetsunori Kaji +2 more | 1995-07-18 |
| 5432315 | Plasma process apparatus including ground electrode with protection film | Tetsunori Kaji, Takashi Fujii, Motohiko Yoshigai, Masaharu Nishiumi | 1995-07-11 |
| 5331191 | Semiconductor integrated circuit device, process for fabricating the same, and apparatus for fabricating the same | Jun Sugiura, Osamu Tsuchiya, Makoto Ogasawara, Fumio Ootsuka, Kazuyoshi Torii +22 more | 1994-07-19 |
| 5290993 | Microwave plasma processing device | Tetsunori Kaji, Takashi Fujii, Motohiko Yoshigai, Masaharu Nishiumi | 1994-03-01 |
| 5276386 | Microwave plasma generating method and apparatus | Seiichi Watanabe, Makoto Nawata, Ryooji Fukuyama, Yutaka Kakehi, Saburo Kanai | 1994-01-04 |
| 5202275 | Semiconductor integrated circuit device, process for fabricating the same, and apparatus for fabricating the same | Jun Sugiura, Osamu Tsuchiya, Makoto Ogasawara, Fumio Ootsuka, Kazuyoshi Torii +22 more | 1993-04-13 |
| 5200017 | Sample processing method and apparatus | Hironobu Kawahara, Yoshiaki Sato, Ryooji Fukuyama, Kazuo Nojiri, Yoshimi Torii | 1993-04-06 |
| 5085750 | Plasma treating method and apparatus therefor | Minolu Soraoka, Katsuyoshi Kudo, Tsunehiko Tsubone | 1992-02-04 |
| 5007981 | Method of removing residual corrosive compounds by plasma etching followed by washing | Hironobu Kawahara, Yoshiaki Sato, Ryooji Fukuyama, Kazuo Nojiri, Yoshimi Torii | 1991-04-16 |
| 4936967 | Method of detecting an end point of plasma treatment | Shoji Ikuhara, Keiji Tada, Katsuyoshi Kudo, Minoru Soraoka | 1990-06-26 |