Issued Patents All Time
Showing 26–45 of 45 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 9472406 | Metal semiconductor alloy contact resistance improvement | Emre Alptekin, Christian Lavoie, Ahmet S. Ozcan, Kathryn T. Schonenberg | 2016-10-18 |
| 9449921 | Voidless contact metal structures | Veeraraghavan S. Basker, Oleg Gluschenkov, Shogo Mochizuki, Alexander Reznicek | 2016-09-20 |
| 9449827 | Metal semiconductor alloy contact resistance improvement | Emre Alptekin, Christian Lavoie, Ahmet S. Ozcan, Kathryn T. Schonenberg | 2016-09-20 |
| 9443772 | Diffusion-controlled semiconductor contact creation | Emre Alptekin, Christian Lavoie, Ahmet S. Ozcan, Kathryn T. Schonenberg, Keith Kwong Hon Wong | 2016-09-13 |
| 9431534 | Asymmetric field effect transistor cap layer | Oleg Gluschenkov | 2016-08-30 |
| 9379012 | Oxide mediated epitaxial nickel disilicide alloy contact formation | Emre Alptekin, Christian Lavoie, Ahmet S. Ozcan, Kathryn T. Schonenberg | 2016-06-28 |
| 9379207 | Stable nickel silicide formation with fluorine incorporation and related IC structure | — | 2016-06-28 |
| 9373512 | Apparatus and method for laser heating and ion implantation | — | 2016-06-21 |
| 9335759 | Optimization of a laser anneal beam path for maximizing chip yield | Oleg Gluschenkov, Keith Kwong Hon Wong | 2016-05-10 |
| 9318336 | Non-volatile memory structure employing high-k gate dielectric and metal gate | Michael P. Chudzik, Rishikesh Krishnan, Siddarth A. Krishnan, Unoh Kwon | 2016-04-19 |
| 9299766 | DT capacitor with silicide outer electrode and/or compressive stress layer, and related methods | Ricardo A. Donaton, Dong-Hun Kang, Herbert L. Ho, Rishikesh Krishnan | 2016-03-29 |
| 9293554 | Self-aligned liner formed on metal semiconductor alloy contacts | Christian Lavoie, Ahmet S. Ozcan, Kathryn T. Schonenberg, Jian-Shen Yu | 2016-03-22 |
| 9236345 | Oxide mediated epitaxial nickel disilicide alloy contact formation | Emre Alptekin, Christian Lavoie, Ahmet S. Ozcan, Kathryn T. Schonenberg | 2016-01-12 |
| 9166014 | Gate electrode with stabilized metal semiconductor alloy-semiconductor stack | Cyril Cabral, Jr., Martin M. Frank, Claude Ortolland | 2015-10-20 |
| 9099394 | Non-volatile memory structure employing high-k gate dielectric and metal gate | Michael P. Chudzik, Rishikesh Krishnan, Siddarth A. Krishnan, Unoh Kwon | 2015-08-04 |
| 9093425 | Self-aligned liner formed on metal semiconductor alloy contacts | Christian Lavoie, Ahmet S. Ozcan, Kathryn T. Schonenberg, Jian-Shen Yu | 2015-07-28 |
| 9093424 | Dual silicide integration with laser annealing | Oleg Gluschenkov | 2015-07-28 |
| 9034749 | Gate electrode with stabilized metal semiconductor alloy-semiconductor stack | Cyril Cabral, Jr., Martin M. Frank, Claude Ortolland | 2015-05-19 |
| 8603887 | Method for depositing a silicon oxide layer of same thickness on silicon and on silicon-germanium | Didier Dutartre, Yves Campidelli, Olivier Gourhant | 2013-12-10 |
| 8552369 | Obtaining elemental concentration profile of sample | Jerome Bienacel | 2013-10-08 |