Issued Patents All Time
Showing 26–50 of 65 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 10325819 | Methods, apparatus and system for providing a pre-RMG replacement metal contact for a finFET device | Jinsheng Gao, Daniel Jaeger, Michael V. Aquilino, Patrick Carpenter, Jessica Dechene +2 more | 2019-06-18 |
| 10269654 | Methods, apparatus and system for replacement contact for a finFET device | Jinsheng Gao, Daniel Jaeger, Michael V. Aquilino, Patrick Carpenter, Jessica Dechene +2 more | 2019-04-23 |
| 10262942 | Method of forming cobalt contact module and cobalt contact module formed thereby | Qiang Fang, Shafaat Ahmed, Changhong Wu, Dinesh R. Koli | 2019-04-16 |
| 10256089 | Replacement contact cuts with an encapsulated low-K dielectric | Huy Cao, Jinsheng Gao, Tai Fong Chao | 2019-04-09 |
| 10229999 | Methods of forming upper source/drain regions on a vertical transistor device | Xusheng Wu, John H. Zhang, Jiehui Shu | 2019-03-12 |
| 10217846 | Vertical field effect transistor formation with critical dimension control | Ruilong Xie, Steven Bentley, Min Gyu Sung, Chanro Park, Steven R. Soss +8 more | 2019-02-26 |
| 10211315 | Vertical field-effect transistor having a dielectric spacer between a gate electrode edge and a self-aligned source/drain contact | Hui Zang | 2019-02-19 |
| 10211103 | Advanced structure for self-aligned contact and method for producing the same | Dinesh R. Koli, Yuan Zhou, Xingzhao Shi, Chih-Chiang Chang, Tai Fong Chao | 2019-02-19 |
| 10204784 | Methods of forming features on integrated circuit products | Jinsheng Gao, Hui Zang | 2019-02-12 |
| 10204797 | Methods, apparatus, and system for reducing step height difference in semiconductor devices | Jinsheng Gao, Daniel Jaeger, Michael V. Aquilino, Patrick Carpenter, Junsic Hong +1 more | 2019-02-12 |
| 10176995 | Methods, apparatus and system for gate cut process using a stress material in a finFET device | Xusheng Wu | 2019-01-08 |
| 10103238 | Nanosheet field-effect transistor with full dielectric isolation | Hui Zang, Tek Po Rinus Lee, Ruilong Xie, Min Gyu Sung, Chanro Park | 2018-10-16 |
| 10090169 | Methods of forming integrated circuit structures including opening filled with insulator in metal gate | Hui Zang | 2018-10-02 |
| 10062772 | Preventing bridge formation between replacement gate and source/drain region through STI structure | Xusheng Wu, Xintuo Dai | 2018-08-28 |
| 10056458 | Siloxane and organic-based MOL contact patterning | Chang Ho Maeng, Andy Wei, Anthony Ozzello, Bharat Krishnan, Guillaume Bouche +9 more | 2018-08-21 |
| 10014298 | Method of forming field effect transistors with replacement metal gates and contacts and resulting structure | Hui Zang, Xiaofeng Qiu | 2018-07-03 |
| 9991363 | Contact etch stop layer with sacrificial polysilicon layer | Jinsheng Gao, Haifeng Sheng, Jinping Liu, Huy Cao, Hui Zang | 2018-06-05 |
| 9991361 | Methods for performing a gate cut last scheme for FinFET semiconductor devices | Xintuo Dai, Xusheng Wu | 2018-06-05 |
| 9966272 | Methods for nitride planarization using dielectric | Haifeng Sheng, Tai Fong Chao, Jiehui Shu, Jinping Liu, Xingzhao Shi +1 more | 2018-05-08 |
| 9935012 | Methods for forming different shapes in different regions of the same layer | Jinsheng Gao | 2018-04-03 |
| 9922972 | Embedded silicon carbide block patterning | Xiaofeng Qiu, Chang Ho Maeng | 2018-03-20 |
| 9916982 | Dielectric preservation in a replacement gate process | Xusheng Wu, John H. Zhang | 2018-03-13 |
| 9911736 | Method of forming field effect transistors with replacement metal gates and contacts and resulting structure | Hui Zang, Xiaofeng Qiu | 2018-03-06 |
| 9865543 | Structure and method for inhibiting cobalt diffusion | Qiang Fang, Stan Tsai, John H. Zhang, Xingzhao Shi, Tai Fong Chao | 2018-01-09 |
| 9837553 | Vertical field effect transistor | Xusheng Wu, John H. Zhang | 2017-12-05 |