DH

David V. Horak

Globalfoundries: 20 patents #152 of 4,424Top 4%
GP Globalfoundries Singapore Pte.: 5 patents #141 of 828Top 20%
FS Freeescale Semiconductor: 2 patents #1,335 of 3,767Top 40%
Samsung: 1 patents #49,284 of 75,807Top 70%
GU Globalfoundries U.S.: 1 patents #22 of 211Top 15%
📍 South Burlington, VT: #1 of 1,136 inventorsTop 1%
🗺 Vermont: #5 of 4,968 inventorsTop 1%
Overall (All Time): #800 of 4,157,543Top 1%
365
Patents All Time

Issued Patents All Time

Showing 226–250 of 365 patents

Patent #TitleCo-InventorsDate
7271444 Wrap-around gate field effect transistor Toshiharu Furukawa, Mark C. Hakey, Charles W. Koburger, III, Peter H. Mitchell 2007-09-18
7271079 Method of doping a gate electrode of a field effect transistor Toshiharu Furukawa, Mark C. Hakey, Steven J. Holmes, Charles W. Koburger, III 2007-09-18
7268028 Well isolation trenches (WIT) for CMOS devices Toshiharu Furukawa, Mark C. Hakey, Charles W. Koburger, III, Jack A. Mandelman, William R. Tonti 2007-09-11
7265013 Sidewall image transfer (SIT) technologies Toshiharu Furukawa, Mark C. Hakey, Steven J. Holmes, Charles W. Koburger, III, Kirk D. Peterson 2007-09-04
7264415 Methods of forming alternating phase shift masks having improved phase-shift tolerance Toshiharu Furukawa, Mark C. Hakey, Steven J. Holmes, Charles W. Koburger, III, Peter H. Mitchell +1 more 2007-09-04
7256114 Process for oxide cap formation in semiconductor manufacturing Steven J. Holmes, Toshiharu Furukawa, Mark C. Hakey, Charles W. Koburger, III, Larry Nesbit 2007-08-14
7233063 Borderless contact structures Toshiharu Furukawa, Charles W. Koburger, III 2007-06-19
7233071 Low-k dielectric layer based upon carbon nanostructures Toshiharu Furukawa, Mark C. Hakey, Steven J. Holmes, Charles W. Koburger, III 2007-06-19
7230681 Method and apparatus for immersion lithography Steven J. Holmes, Toshiharu Furukawa, Mark C. Hakey, Daniel A. Corliss, Charles W. Koburger, III 2007-06-12
7229885 Formation of a disposable spacer to post dope a gate conductor Toshiharu Furukawa, Akihisa Sekiguchi 2007-06-12
7229909 Integrated circuit chip utilizing dielectric layer having oriented cylindrical voids formed from carbon nanotubes Toshiharu Furukawa, Mark C. Hakey, Steven J. Holmes, Charles W. Koburger, III, Peter H. Mitchell 2007-06-12
7229889 Methods for metal plating of gate conductors and semiconductors formed thereby Steven J. Holmes, Charles W. Koburger, III, Toshiharu Furukawa, Mark C. Hakey 2007-06-12
7227233 Silicon-on-insulator (SOI) Read Only Memory (ROM) array and method of making a SOI ROM Toshiharu Furukawa, Mark C. Hakey, Steven J. Holmes, Charles W. Koburger, III, Jack A. Mandelman 2007-06-05
7211844 Vertical field effect transistors incorporating semiconducting nanotubes grown in a spacer-defined passage Toshiharu Furukawa, Mark C. Hakey, Steven J. Holmes, Peter H. Mitchell, Larry Nesbit 2007-05-01
7176089 Vertical dual gate field effect transistor Toshiharu Furukawa, Mark C. Hakey, Steven J. Holmes, James M. Leas, William H. Ma +1 more 2007-02-13
7135773 Integrated circuit chip utilizing carbon nanotube composite interconnection vias Toshiharu Furukawa, Mark C. Hakey, Charles W. Koburger, III, Mark E. Masters, Peter H. Mitchell +1 more 2006-11-14
7129097 Integrated circuit chip utilizing oriented carbon nanotube conductive layers Toshiharu Furukawa, Mark C. Hakey, Steven J. Holmes, Charles W. Koburger, III, Peter H. Mitchell 2006-10-31
7118997 Implantation of gate regions in semiconductor device fabrication Toshiharu Furukawa, Mark C. Hakey, Steven J. Holmes, Charles Koburger 2006-10-10
7109546 Horizontal memory gain cells Toshiharu Furukawa, Mark C. Hakey, Charles W. Koburger, III, Mark E. Masters, Peter H. Mitchell 2006-09-19
7102201 Strained semiconductor device structures Toshiharu Furukawa, Mark C. Hakey, Steven J. Holmes, Charles W. Koburger, III 2006-09-05
7088422 Moving lens for immersion optical lithography Mark C. Hakey, Charles W. Koburger, III, Peter H. Mitchell 2006-08-08
7087531 Shallow trench isolation formation Toshiharu Furukawa, Mark C. Hakey, Steven J. Holmes, Charles W. Koburger, III 2006-08-08
7084060 Forming capping layer over metal wire structure using selective atomic layer deposition Toshiharu Furukawa, Steven J. Holmes, Charles W. Koburger, III 2006-08-01
7077903 Etch selectivity enhancement for tunable etch resistant anti-reflective layer Katherina Babich, Scott D. Halle, Arpan Mahorowala, Wesley C. Natzle, Dirk Pfeiffer +1 more 2006-07-18
7074666 Borderless contact structures Toshiharu Furukawa, Charles W. Koburger, III 2006-07-11