YP

Yelehanka Ramachandramurthy Pradeep

CM Chartered Semiconductor Manufacturing: 57 patents #6 of 840Top 1%
GP Globalfoundries Singapore Pte.: 2 patents #291 of 828Top 40%
📍 Singapore, SG: #50 of 13,971 inventorsTop 1%
Overall (All Time): #40,653 of 4,157,543Top 1%
59
Patents All Time

Issued Patents All Time

Showing 1–25 of 59 patents

Patent #TitleCo-InventorsDate
9633882 Integrated circuits with alignment marks and methods of producing the same Ying Yu, Jianbo Sun, Derui Yin, Rakesh Kumar 2017-04-25
8293545 Critical dimension for trench and vias Hai Cong, Yan Shan Li, Chun Hui Low, Liang-Choo Hsia 2012-10-23
7382027 MOSFET device with low gate contact resistance Purakh Raj Verma, Sanford Chu, Lap Chan, Kai Shao, Jia Zhen Zheng 2008-06-03
6861317 Method of making direct contact on gate by using dielectric stop layer Purakh Raj Verma, Sanford Chu, Lap Chan, Kai Shao, Jia Zhen Zheng 2005-03-01
6852605 Method of forming an inductor with continuous metal deposition Chit Hwei Ng, Lap Chan, Purakh Raj Verma, Sanford Chu 2005-02-08
6821904 Method of blocking nitrogen from thick gate oxide during dual gate CMP Sanford Chu, Chit Hwei Ng, Jia Zhen Zheng, Purakh Raj Verma 2004-11-23
6791083 Image compensation device for a scanning electron microscope Kevin Peng, Chua Thow Phock 2004-09-14
6726545 Linear polishing for improving substrate uniformity Subramanian Balakumar, Chen Feng, Victor Lim, Paul Proctor, Mukhopadhyay Madhusudan +1 more 2004-04-27
6716693 Method of forming a surface coating layer within an opening within a body by atomic layer deposition Lap Chan, Sanford Chu, Chit Hwei Ng, Jia Zhen Zheng 2004-04-06
6709934 Method for forming variable-K gate dielectric James Yong Meng Lee, Ying-Keung Leung, Jia Zhen Zheng, Lap Chan, Elgin Quek +2 more 2004-03-23
6660642 Toxic residual gas removal by non-reactive ion sputtering Zou Zheng, Zhou Mei Sheng, Paul Proctor 2003-12-09
6632745 Method of forming almost L-shaped spacer for improved ILD gap fill Chiew Wah Yap, Zheng Zou, Eng Hua Lim, Nguyen Lac, Manni Lal 2003-10-14
6566208 Method to form elevated source/drain using poly spacer Yang Pan, Lee Yong Meng, Leung Keung, Jia Zhen Zheng, Lap Chan +2 more 2003-05-20
6544824 Method to form a vertical transistor by first forming a gate/spacer stack, then using selective epitaxy to form source, drain and channel Jia Zhen Zheng, Lap Chan, Elgin Quek, Ravi Sundaresan, Yang Pan +2 more 2003-04-08
6541327 Method to form self-aligned source/drain CMOS device on insulated staircase oxide Lap Chan, Elgin Quek, Ravi Sundaresan, Yang Pan, James Yong Meng Lee +2 more 2003-04-01
6511884 Method to form and/or isolate vertical transistors Elgin Quek, Ravi Sundaresan, Yang Pan, Yong Meng Lee, Ying-Keung Leung +2 more 2003-01-28
6468853 Method of fabricating a shallow trench isolation structure with reduced local oxide recess near corner Palanivel Balasubramanian, Chivkula Subrahmanyam, Narayanan Balasubramanian 2002-10-22
6468877 Method to form an air-gap under the edges of a gate electrode by using disposable spacer/liner Jia Zhen Zheng, Lap Chan, Elgin Quek, Ravi Sundaresan, Yang Pan +2 more 2002-10-22
6461887 Method to form an inverted staircase STI structure by etch-deposition-etch and selective epitaxial growth Jia Zhen Zheng, Lap Chan, Elgin Quek, Ravi Sundaresan, Yang Pan +2 more 2002-10-08
6461900 Method to form a self-aligned CMOS inverter using vertical device integration Ravi Sundaresan, Yang Pan, James Lee Yong Meng, Ying-Keung Leung, Jia Zhen Zheng +2 more 2002-10-08
6455377 Method to form very high mobility vertical channel transistor by selective deposition of SiGe or multi-quantum wells (MQWs) Jia Zhen Zheng, Lap Chan, Elgin Quek, Ravi Sundaresan, Yang Pan +2 more 2002-09-24
6451704 Method for forming PLDD structure with minimized lateral dopant diffusion Subrahmanyam Chivukula, Jie Ye, Madhudsudan Mukhopdhyay 2002-09-17
6440800 Method to form a vertical transistor by selective epitaxial growth and delta doped silicon layers James Yong Meng Lee, Ying-Keung Leung, Jia Zhen Zheng, Lap Chan, Elgin Quek +2 more 2002-08-27
6436774 Method for forming variable-K gate dielectric James Yong Meng Lee, Ying-Keung Leung, Jia Zhen Zheng, Lap Chan, Elgin Quek +2 more 2002-08-20
6436770 Method to control the channel length of a vertical transistor by first forming channel using selective epi and source/drain using implantation Ying-Keung Leung, Jia Zhen Zheng, Lap Chan, Elgin Quek, Ravi Sundaresan +2 more 2002-08-20