JL

James Yong Meng Lee

CM Chartered Semiconductor Manufacturing: 27 patents #23 of 840Top 3%
GP Globalfoundries Singapore Pte.: 3 patents #212 of 828Top 30%
NS National University Of Singapore: 2 patents #231 of 1,623Top 15%
📍 Singapore, SG: #158 of 13,971 inventorsTop 2%
Overall (All Time): #125,725 of 4,157,543Top 4%
30
Patents All Time

Issued Patents All Time

Showing 1–25 of 30 patents

Patent #TitleCo-InventorsDate
8178417 Method of forming shallow trench isolation structures for integrated circuits Shailendra Mishra, Zhao Lun, Wen Zhi Gao, Chung Woh Lai, Huang Liu +2 more 2012-05-15
8143651 Nested and isolated transistors with reduced impedance difference Johnny Widodo, Liang-Choo Hsia, Wen Zhi Gao, Zhao Lun, Huang Liu +5 more 2012-03-27
7999300 Memory cell structure and method for fabrication thereof Zhao Lun, Lee-Wee Teo, Shyue Seng Tan, Chung Woh Lai, Johnny Widodo +2 more 2011-08-16
7795680 Integrated circuit system employing selective epitaxial growth technology Huang Liu, Alex See, Johnny Widodo, Chung Woh Lai, Wenzhi Gao +3 more 2010-09-14
7767577 Nested and isolated transistors with reduced impedance difference Johnny Widodo, Liang-Choo Hsia, Wen Zhi Gao, Zhao Lun, Huang Liu +5 more 2010-08-03
7091092 Process flow for a performance enhanced MOSFET with self-aligned, recessed channel Sneedharan Pillai Sneelal, Francis Poh, Alex See, C. K. Lau, Ganesh Samudra 2006-08-15
7037791 Application of single exposure alternating aperture phase shift mask to form sub 0.18 micron polysilicon gates Lay Cheng Choo, Lap Chan 2006-05-02
6747314 Method to form a self-aligned CMOS inverter using vertical device integration Ravi Sundaresan, Yang Pan, Ying-Keung Leung, Yelehanka Ramachandramurthy, Jia Zhen Zheng +2 more 2004-06-08
6709934 Method for forming variable-K gate dielectric Ying-Keung Leung, Yelehanka Ramachandramurthy Pradeep, Jia Zhen Zheng, Lap Chan, Elgin Quek +2 more 2004-03-23
6541327 Method to form self-aligned source/drain CMOS device on insulated staircase oxide Lap Chan, Elgin Quek, Ravi Sundaresan, Yang Pan, Ying-Keung Leung +2 more 2003-04-01
6475916 Method of patterning gate electrode with ultra-thin gate dielectric Yun Zhang, Chock Hing Gan, Ravi Sundaresan 2002-11-05
6468877 Method to form an air-gap under the edges of a gate electrode by using disposable spacer/liner Yelehanka Ramachandramurthy Pradeep, Jia Zhen Zheng, Lap Chan, Elgin Quek, Ravi Sundaresan +2 more 2002-10-22
6461887 Method to form an inverted staircase STI structure by etch-deposition-etch and selective epitaxial growth Yelehanka Ramachandramurthy Pradeep, Jia Zhen Zheng, Lap Chan, Elgin Quek, Ravi Sundaresan +2 more 2002-10-08
6458717 Methods of forming ultra-thin buffer oxide layers for gate dielectrics Xia Li, Yunqzang Zhang 2002-10-01
6455377 Method to form very high mobility vertical channel transistor by selective deposition of SiGe or multi-quantum wells (MQWs) Jia Zhen Zheng, Lap Chan, Elgin Quek, Ravi Sundaresan, Yang Pan +2 more 2002-09-24
6440800 Method to form a vertical transistor by selective epitaxial growth and delta doped silicon layers Ying-Keung Leung, Yelehanka Ramachandramurthy Pradeep, Jia Zhen Zheng, Lap Chan, Elgin Quek +2 more 2002-08-27
6436770 Method to control the channel length of a vertical transistor by first forming channel using selective epi and source/drain using implantation Ying-Keung Leung, Yelehanka Ramachandramurthy Pradeep, Jia Zhen Zheng, Lap Chan, Elgin Quek +2 more 2002-08-20
6436774 Method for forming variable-K gate dielectric Ying-Keung Leung, Yelehanka Ramachandramurthy Pradeep, Jia Zhen Zheng, Lap Chan, Elgin Quek +2 more 2002-08-20
6417054 Method for fabricating a self aligned S/D CMOS device on insulated layer by forming a trench along the STI and fill with oxide Jia Zhen Zheng, Lap Chan, Elgin Quek, Ravi Sundaresan, Yang Pan +2 more 2002-07-09
6417056 Method to form low-overlap-capacitance transistors by forming microtrench at the gate edge Elgin Quek, Ravi Sundaresan, Yang Pan, Ying-Keung Leung, Yelehanka Ramachandramurthy Pradeep +2 more 2002-07-09
6406945 Method for forming a transistor gate dielectric with high-K and low-K regions Ying-Keung Leung, Yelehanka Ramachandramurthy Pradeep, Jia Zhen Zheng, Lap Chan, Elgin Quek +2 more 2002-06-18
6403484 Method to achieve STI planarization Victor Lim, Lap Chan, Chen Feng, Wang Ling Goh 2002-06-11
6391720 Process flow for a performance enhanced MOSFET with self-aligned, recessed channel Sneedharan Pillai Sneelal, Francis Poh, Alex See, C. K. Lau, Ganesh Samudra 2002-05-21
6380088 Method to form a recessed source drain on a trench side wall with a replacement gate technique Lap Chan, Elgin Quek, Ravi Sundaresan, Yang Pan, Ying-Keung Leung +2 more 2002-04-30
6313008 Method to form a balloon shaped STI using a micro machining technique to remove heavily doped silicon Ying-Keung Leung, Yelehanka Ramachandramurthy Pradeep, Jia Zhen Zheng, Lap Chan, Elgin Quek +2 more 2001-11-06