Issued Patents All Time
Showing 26–38 of 38 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 9639005 | Imaging catoptric EUV projection optical unit | Thomas Schicketanz | 2017-05-02 |
| 9625827 | Imaging optical unit for EUV projection lithography | Josef Rapp | 2017-04-18 |
| 9551941 | Illumination system for an EUV lithography device and facet mirror therefor | Ingo Saenger, Joerg Zimmermann, Daniel Kraehmer, Christoph Hennerkes, Frank Schlesener | 2017-01-24 |
| 9535332 | Mask for EUV lithography, EUV lithography system and method for optimising the imaging of a mask | Daniel Kraehmer | 2017-01-03 |
| 9507269 | Illumination optical unit for projection lithography | Christoph Hennerkes, Ingo Saenger, Joerg Zimmermann, Martin Meier, Frank Schlesener | 2016-11-29 |
| 9500956 | Optical system of a microlithographic projection exposure apparatus, and microlithographic exposure | Ingo Saenger, Joerg Zimmermann, Martin Meier, Frank Schlesener, Christoph Hennerkes | 2016-11-22 |
| 9298097 | Projection exposure apparatus for EUV microlithography and method for microlithographic exposure | Marc Bienert, Heiko Feldmann, Aksel Goehnermeier, Oliver Natt | 2016-03-29 |
| 9041908 | Method for operating a projection exposure apparatus with correction of imaging aberrations induced by the mask | — | 2015-05-26 |
| 8681184 | Display unit, and displaying method for the binocular representation of a multicolor image | Markus Seesselberg | 2014-03-25 |
| 8674329 | Method and apparatus for analyzing and/or repairing of an EUV mask defect | Michael Budach, Tristan Bret, Klaus Edinger, Thorsten Hofmann, Heiko Feldmann | 2014-03-18 |
| 8126669 | Optimization and matching of optical systems by use of orientation Zernike polynomials | Michael Totzeck, Daniel Kraehmer, Ralf Mueller, Vladan Blahnik | 2012-02-28 |
| 7679831 | Projection objective of a microlithographic projection exposure apparatus | Daniel Kraehmer | 2010-03-16 |
| 7408712 | Polarization-selectively blazed, diffractive optical element | Bernd Kleemann | 2008-08-05 |