Issued Patents All Time
Showing 1–15 of 15 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 9594304 | Lithography apparatus, a device manufacturing method, a method of manufacturing an attenuator | Arno Jan Bleeker | 2017-03-14 |
| 9513561 | Lithographic apparatus, method for maintaining a lithographic apparatus and device manufacturing method | Arno Jan Bleeker, Theodorus Petrus Maria Cadee | 2016-12-06 |
| 9494869 | Lithographic apparatus and device manufacturing method | Hans Butler, Arno Jan Bleeker, Pieter Renaat Maria Hennus, Sven Antoin Johan Hol, Harmen Klaas Van Der Schoot +9 more | 2016-11-15 |
| 9354502 | Lithography apparatus, an apparatus for providing setpoint data, a device manufacturing method, a method for providing setpoint data and a computer program | Erik Roelof Loopstra | 2016-05-31 |
| 8717535 | SLM calibration | Huibert Visser, Borgert Kruizinga, Bob Streefkerk, Patricius Aloysius Jacobus Tinnemans, Erwin John Van Zwet +4 more | 2014-05-06 |
| 7965373 | Lithographic apparatus and device manufacturing method utilizing a datapath having a balanced calculation load | Patricius Aloysius Jacobus Tinnemans | 2011-06-21 |
| 7812930 | Lithographic apparatus and device manufacturing method using repeated patterns in an LCD to reduce datapath volume | Theodorus Leonardus Van Den Akker, Pieter Willem Herman De Jager, Lambertus Gerardus Maria Kessels, Marco Cornelis Jacobus Martinus Van Hassel, Frank Anton Morselt | 2010-10-12 |
| 7791710 | System and method for determining maximum operational parameters used in maskless applications | — | 2010-09-07 |
| 7460208 | Lithographic apparatus and device manufacturing method | Arno Jan Bleeker, Dominicus Jacobus Petrus Adrianus Franken, Lambertus Gerardus Maria Kessels, Tobrjörn Sandström | 2008-12-02 |
| 7403865 | System and method for fault indication on a substrate in maskless applications | — | 2008-07-22 |
| 7362415 | Lithographic apparatus and device manufacturing method | Dominicus Jacobus Petrus Adrianus Franken, Arno Jano Bleeker, Wilhelmus Josephus Box, Henricus Gerardus Tegenbosch, Kars Zeger Troost +1 more | 2008-04-22 |
| 7145636 | System and method for determining maximum operational parameters used in maskless applications | — | 2006-12-05 |
| 7092231 | Chuck, lithographic apparatus and device manufacturing method | Joost Jeroen Ottens | 2006-08-15 |
| 6894261 | Position measuring system for use in lithographic apparatus | Thomas Josephus Maria Castenmiller, Andreas Ariens, Patrick David Vogelsang, Erik Roelof Loopstra, YimBun P. Kwan | 2005-05-17 |
| 6875992 | Position measuring device, position measuring system, lithographic apparatus, and device manufacturing method | Thomas Josephus Maria Castenmiller, Andreas Ariens, Patrick David Vogelsang, Erik Roelof Loopstra, YimBun P. Kwan | 2005-04-05 |