Issued Patents All Time
Showing 101–118 of 118 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 5900062 | Lift pin for dechucking substrates | Peter Loewenhardt, Hiroji Hanawa, Raymond Gristi, Gerald Yin | 1999-05-04 |
| 5891348 | Process gas focusing apparatus and method | Gerald Yin, Diana Xiaobing Ma, Steve S. Y. Mak | 1999-04-06 |
| 5879575 | Self-cleaning plasma processing reactor | Avi Tepman | 1999-03-09 |
| 5817534 | RF plasma reactor with cleaning electrode for cleaning during processing of semiconductor wafers | Hiroji Hanawa, Diana Xiaobing Ma, Gerald Yin, Peter Loewenhardt, Donald Olgado +2 more | 1998-10-06 |
| 5801386 | Apparatus for measuring plasma characteristics within a semiconductor wafer processing system and a method of fabricating and using same | Valentin Todorov, Yoshi Tanase, Xue-Yu Qian, Arthur H. Sato, Peter Loewenhardt +2 more | 1998-09-01 |
| 5756400 | Method and apparatus for cleaning by-products from plasma chamber surfaces | Diana Xiaobing Ma, Gerald Yin, Keshav Prasad, Mark Siegel, Steve S. Y. Mak +3 more | 1998-05-26 |
| 5753137 | Dry cleaning of semiconductor processing chambers using non-metallic, carbon-comprising material | Charles S. Rhoades, Gerald Yin | 1998-05-19 |
| 5710486 | Inductively and multi-capacitively coupled plasma reactor | Hiroji Hanawa, Diana Xiaobing Ma, Gerald Yin | 1998-01-20 |
| 5685916 | Dry cleaning of semiconductor processing chambers | Charles S. Rhoades, Gerald Yin | 1997-11-11 |
| 5676759 | Plasma dry cleaning of semiconductor processing chambers | Charles S. Rhoades, Gerald Yin | 1997-10-14 |
| 5628870 | Method for marking a substrate using ionized gas | Anand Gupta, Yuri S. Uritsky | 1997-05-13 |
| 5622565 | Reduction of contaminant buildup in semiconductor apparatus | Anand Gupta, Shamouil Shamouliam | 1997-04-22 |
| 5608155 | Method and apparatus for detecting particles on a substrate | Anand Gupta | 1997-03-04 |
| 5578131 | Reduction of contaminant buildup in semiconductor processing apparatus | Anand Gupta, Shamouil Shamouliam | 1996-11-26 |
| 5486235 | Plasma dry cleaning of semiconductor processing chambers | Charles S. Rhoades, Gerald Yin | 1996-01-23 |
| 5474640 | Apparatus for marking a substrate using ionized gas | Anand Gupta, Yuri S. Uritsky | 1995-12-12 |
| 5456796 | Control of particle generation within a reaction chamber | Anand Gupta, Joseph Lanucha | 1995-10-10 |
| 5423918 | Method for reducing particulate contamination during plasma processing of semiconductor devices | Anand Gupta, Charles S. Rhoades, Joseph Lanucha | 1995-06-13 |