Issued Patents All Time
Showing 26–44 of 44 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 6364954 | High temperature chemical vapor deposition chamber | Steve H. Chiao, Anh N. Nguyen, Be Van Vo, Joel M. Huston, James Jin-Long Chen +1 more | 2002-04-02 |
| 6302964 | One-piece dual gas faceplate for a showerhead in a semiconductor wafer processing system | Lawrence Chung-Lai Lei, Anh N. Nguyen, Steve H. Chiao | 2001-10-16 |
| 6302965 | Dispersion plate for flowing vaporizes compounds used in chemical vapor deposition of films onto semiconductor surfaces | Vincent Ku, Xiaoxiong Yuan, Lawrence Chung-Lai Lei | 2001-10-16 |
| 6223447 | Fastening device for a purge ring | Joseph Yudovsky, Lawrence Chung-Lai Lei, Ronald L. Rose | 2001-05-01 |
| 6206971 | Integrated temperature controlled exhaust and cold trap assembly | Lawrence Chung-Lai Lei, Russell C. Ellwanger, Ronald L. Rose, Joel M. Huston, James Jin-Long Chen | 2001-03-27 |
| 6167834 | Thermal CVD/PECVD reactor and use for thermal chemical vapor deposition of silicon dioxide and in-situ multi-step planarized process | David N. Wang, John M. White, Kam S. Law, Cissy Leung, Kenneth S. Collins +3 more | 2001-01-02 |
| 6086677 | Dual gas faceplate for a showerhead in a semiconductor wafer processing system | Lawrence Chung-Lai Lei, Anh N. Nguyen, Steve H. Chiao | 2000-07-11 |
| 6079356 | Reactor optimized for chemical vapor deposition of titanium | Anh N. Nguyen, Truc T. Tran, Lawrence Chung-Lei, Mei Chang | 2000-06-27 |
| RE36623 | Process for PECVD of silicon oxide using TEOS decomposition | David N. Wang, John M. White, Kam S. Law, Cissy Leung, Kenneth S. Collins +3 more | 2000-03-21 |
| 5906683 | Lid assembly for semiconductor processing chamber | Aihua Chen | 1999-05-25 |
| 5888304 | Heater with shadow ring and purge above wafer surface | Alan F. Morrison, Karl A. Littau, Richard A. Marsh, Lawrence Chung-Lai Lei, Dale R. DuBois | 1999-03-30 |
| 5871811 | Method for protecting against deposition on a selected region of a substrate | David N. Wang, John M. White, Kam S. Law, Cissy Leung, Kenneth S. Collins +3 more | 1999-02-16 |
| 5766365 | Removable ring for controlling edge deposition in substrate processing apparatus | Alan F. Morrison, Karl A. Littau, Richard A. Marsh, Lawrence Chung-Lai Lei | 1998-06-16 |
| 5755886 | Apparatus for preventing deposition gases from contacting a selected region of a substrate during deposition processing | David N. Wang, John M. White, Kam S. Law, Cissy Leung, Kenneth S. Collins +3 more | 1998-05-26 |
| 5362526 | Plasma-enhanced CVD process using TEOS for depositing silicon oxide | David N. Wang, John M. White, Kam S. Law, Cissy Leung, Kenneth S. Collins +3 more | 1994-11-08 |
| 5354715 | Thermal chemical vapor deposition of silicon dioxide and in-situ multi-step planarized process | David N. Wang, John M. White, Kam S. Law, Cissy Leung, Kenneth S. Collins +3 more | 1994-10-11 |
| 5000113 | Thermal CVD/PECVD reactor and use for thermal chemical vapor deposition of silicon dioxide and in-situ multi-step planarized process | David N. Wang, John M. White, Kam S. Law, Cissy Leung, Kenneth S. Collins +3 more | 1991-03-19 |
| 4892753 | Process for PECVD of silicon oxide using TEOS decomposition | David N. Wang, John M. White, Kam S. Law, Cissy Leung, Kenneth S. Collins +3 more | 1990-01-09 |
| 4872947 | CVD of silicon oxide using TEOS decomposition and in-situ planarization process | David N. Wang, John M. White, Kam S. Law, Cissy Leung, Kenneth S. Collins +3 more | 1989-10-10 |