Issued Patents All Time
Showing 26–38 of 38 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 8698048 | High temperature vacuum chuck assembly | Alexander Lerner, Blake Koelmel | 2014-04-15 |
| 8608853 | Thermal reactor with improved gas flow distribution | Ming-Kuei Tseng, Norman L. Tam, Yoshitaka Yokota, Agus Sofian Tjandra, Robert Navasca +3 more | 2013-12-17 |
| 8567756 | Slit valve door able to compensate for chamber deflection | Shinichi Kurita, John M. White, Suhail Anwar, Makoto Inagawa | 2013-10-29 |
| 8528762 | Electron beam welding of large vacuum chamber body having a high emissivity coating | Shinichi Kurita, Makoto Inagawa | 2013-09-10 |
| 8497193 | Method of thermally treating silicon with oxygen | Yoshitaka Yokota, Sundar Ramamurthy, Vedapuram S. Achutharaman, Cory Czarnik, Christopher S. Olsen | 2013-07-30 |
| 8409353 | Water cooled gas injector | Yoshitaka Yokota, Sundar Ramamurthy, Vedapuram S. Achutharaman, Cory Czarnik, Christopher S. Olsen | 2013-04-02 |
| 8256754 | Lift pin for substrate processing | Alexander Lerner, Paula Valdivia | 2012-09-04 |
| 8222574 | Temperature measurement and control of wafer support in thermal processing chamber | Khurshed Sorabji, Alexander Lerner, Joseph M. Ranish, Aaron Muir Hunter, Bruce E. Adams +1 more | 2012-07-17 |
| 8198567 | High temperature vacuum chuck assembly | Alexander Lerner, Blake Koelmel | 2012-06-12 |
| 8070408 | Load lock chamber for large area substrate processing system | Shinichi Kurita, Makoto Inagawa, Suhail Anwar | 2011-12-06 |
| 8056500 | Thermal reactor with improved gas flow distribution | Ming-Kuei Tseng, Norman L. Tam, Yoshitaka Yokota, Agus Sofian Tjandra, Robert Navasca +3 more | 2011-11-15 |
| 7972441 | Thermal oxidation of silicon using ozone | Yoshitaka Yokota, Sundar Ramamurthy, Vedapuram S. Achutharaman, Cory Czarnik, Christopher S. Olsen | 2011-07-05 |
| 7860379 | Temperature measurement and control of wafer support in thermal processing chamber | Aaron Muir Hunter, Bruce E. Adams, Rajesh S. Ramanujam, Joseph M. Ranish | 2010-12-28 |