Issued Patents All Time
Showing 26–47 of 47 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 6080046 | Underwater wafer storage and wafer picking for chemical mechanical polishing | Norm Shendon, Eugene Gantvarg, Harry Q. Lee, Robert D. Tolles, Sasson Somekh | 2000-06-27 |
| RE36623 | Process for PECVD of silicon oxide using TEOS decomposition | David N. Wang, John M. White, Kam S. Law, Cissy Leung, Salvador P. Umotoy +3 more | 2000-03-21 |
| 6036583 | Conditioner head in a substrate polisher and method | Eugene Gantvarg | 2000-03-14 |
| 5964653 | Carrier head with a flexible membrane for a chemical mechanical polishing system | Eugene Gantvarg, Sen-Hou Ko | 1999-10-12 |
| 5951770 | Carousel wafer transfer system | Alexey Goder, Eugene Gantvarg | 1999-09-14 |
| 5935338 | Chemical vapor deposition chamber | Lawrence Chung-Lai Lei, Karl A. Littau, Alan F. Morrison, Mei Chang, Ashok Sinha | 1999-08-10 |
| 5931724 | Mechanical fastener to hold a polishing pad on a platen in a chemical mechanical polishing system | Eugene Gantvarg | 1999-08-03 |
| 5893795 | Apparatus for moving a cassette | Eugene Gantvarg | 1999-04-13 |
| 5882419 | Chemical vapor deposition chamber | Ashok Sinha, Mei Chang, Karl A. Littau, Alan F. Morrison, Lawrence Chung-Lai Lei | 1999-03-16 |
| 5871811 | Method for protecting against deposition on a selected region of a substrate | David N. Wang, John M. White, Kam S. Law, Cissy Leung, Salvador P. Umotoy +3 more | 1999-02-16 |
| 5856240 | Chemical vapor deposition of a thin film onto a substrate | Ashok Sinha, Mei Chang, Karl A. Littau, Alan F. Morrison, Lawrence Chung-Lai Lei | 1999-01-05 |
| 5804507 | Radially oscillating carousel processing system for chemical mechanical polishing | Eugene Gantvarg, Harry Q. Lee, Sasson Somekh, Robert D. Tolles | 1998-09-08 |
| 5755886 | Apparatus for preventing deposition gases from contacting a selected region of a substrate during deposition processing | David N. Wang, John M. White, Kam S. Law, Cissy Leung, Salvador P. Umotoy +3 more | 1998-05-26 |
| 5738574 | Continuous processing system for chemical mechanical polishing | Robert D. Tolles, Norm Shendon, Sasson Somekh, Eugene Gantvarg, Harry Q. Lee | 1998-04-14 |
| 5695568 | Chemical vapor deposition chamber | Ashok Sinha, Mei Chang, Karl A. Littau, Alan F. Morrison, Lawrence Chung-Lai Lei | 1997-12-09 |
| 5516367 | Chemical vapor deposition chamber with a purge guide | Lawrence Chung-Lai Lei, Karl A. Littau, Alan F. Morrison, Mei Chang, Ashok Sinha | 1996-05-14 |
| 5421893 | Susceptor drive and wafer displacement mechanism | — | 1995-06-06 |
| 5362526 | Plasma-enhanced CVD process using TEOS for depositing silicon oxide | David N. Wang, John M. White, Kam S. Law, Cissy Leung, Salvador P. Umotoy +3 more | 1994-11-08 |
| 5354715 | Thermal chemical vapor deposition of silicon dioxide and in-situ multi-step planarized process | David N. Wang, John M. White, Kam S. Law, Cissy Leung, Salvador P. Umotoy +3 more | 1994-10-11 |
| 5000113 | Thermal CVD/PECVD reactor and use for thermal chemical vapor deposition of silicon dioxide and in-situ multi-step planarized process | David N. Wang, John M. White, Kam S. Law, Cissy Leung, Salvador P. Umotoy +3 more | 1991-03-19 |
| 4892753 | Process for PECVD of silicon oxide using TEOS decomposition | David N. Wang, John M. White, Kam S. Law, Cissy Leung, Salvador P. Umotoy +3 more | 1990-01-09 |
| 4872947 | CVD of silicon oxide using TEOS decomposition and in-situ planarization process | David N. Wang, John M. White, Kam S. Law, Cissy Leung, Salvador P. Umotoy +3 more | 1989-10-10 |