Issued Patents All Time
Showing 26–41 of 41 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 10903066 | Heater support kit for bevel etch chamber | Tuan Nguyen, Jeongmin Lee, Anjana M. Patel | 2021-01-26 |
| 10879041 | Method and apparatus of achieving high input impedance without using ferrite materials for RF filter applications in plasma chambers | Zheng John Ye, Amit Kumar BANSAL, Kwangduk Douglas Lee, Xing Lin, Jianhua Zhou +2 more | 2020-12-29 |
| 10811325 | Self-healing semiconductor wafer processing | — | 2020-10-20 |
| 10663491 | Voltage-current probe for measuring radio-frequency electrical power in a high-temperature environment and method of calibrating the same | Zheng John Ye, Jay D. Pinson, II, Juan Carlos Rocha | 2020-05-26 |
| 10636630 | Processing chamber and method with thermal control | Hemant P. Mungekar, Ganesh Balasubramanian, Yoichi Suzuki | 2020-04-28 |
| 10629427 | Bevel etch profile control | Zonghui SU, Vinay Prabhakar, Jeongmin Lee | 2020-04-21 |
| 10599043 | Critical methodology in vacuum chambers to determine gap and leveling between wafer and hardware components | Hiroyuki Ogiso, Jianhua Zhou, Zonghui SU, Juan Carlos Rocha-Alvarez, Jeongmin Lee +4 more | 2020-03-24 |
| 10276364 | Bevel etch profile control | Zonghui SU, Vinay Prabhakar, Jeongmin Lee | 2019-04-30 |
| 10266943 | Plasma corrosion resistive heater for high temperature processing | Ren-Guan Duan, Amit Kumar BANSAL, Jianhua Zhou, Juan Carlos Rocha-Alvarez | 2019-04-23 |
| 10192717 | Conditioning remote plasma source for enhanced performance having repeatable etch and deposition rates | Mohamad A. Ayoub, Jay D. Pinson, II, Juan Carlos Rocha-Alvarez | 2019-01-29 |
| 10128088 | Graded in-situ charge trapping layers to enable electrostatic chucking and excellent particle performance for boron-doped carbon films | Prashant Kumar Kulshreshtha, Ziqing Duan, Zheng John Ye, Amit Kumar BANSAL | 2018-11-13 |
| 10109462 | Dual radio-frequency tuner for process control of a plasma process | Edward P. Hammond, IV, Tza-Jing Gung | 2018-10-23 |
| 10083818 | Auto frequency tuned remote plasma source | Mohamad A. Ayoub, Ramesh Bokka, Jay D. Pinson, II, Juan Carlos Rocha-Alvarez | 2018-09-25 |
| 9711360 | Methods to improve in-film particle performance of amorphous boron-carbon hardmask process in PECVD system | Ziqing Duan, Kwangduk Douglas Lee, Amit Kumar BANSAL, Bok Hoen Kim, Prashant Kumar Kulshreshtha | 2017-07-18 |
| 9589773 | In-situ etch rate determination for chamber clean endpoint | Sidharth Bhatia, Anjana M. Patel | 2017-03-07 |
| 9466469 | Remote plasma source for controlling plasma skew | Mohamad A. Ayoub, Ramesh Bokka, Jay D. Pinson, II, Juan Carlos Rocha-Alvarez | 2016-10-11 |