Issued Patents All Time
Showing 76–96 of 96 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 6269322 | System and method for wafer alignment which mitigates effects of reticle rotation and magnification on overlay | Bharath Rangarajan, Kathleen R. Early, Terry Manchester | 2001-07-31 |
| 6248175 | Nozzle arm movement for resist development | Ramkumar Subramanian, Khoi A. Phan, Bharath Rangarajan, Bhanwar Singh, Sanjay K. Yedur | 2001-06-19 |
| 6245493 | Method for reducing surface reflectivity by increasing surface roughness | Bhanwar Singh, Bharath Rangarajan, Sanjay K. Yedur, Christopher F. Lyons | 2001-06-12 |
| 6238830 | Active control of temperature in scanning probe lithography and maskless lithograpy | Bharath Rangarajan, Bhanwar Singh | 2001-05-29 |
| 6214737 | Simplified sidewall formation for sidewall patterning of sub 100 nm structures | Christopher F. Lyons, Kathleen R. Early | 2001-04-10 |
| 6196734 | CD uniformity by active control of developer temperature | Bharath Rangarajan | 2001-03-06 |
| 6197455 | Lithographic mask repair using a scanning tunneling microscope | Sanjay K. Yedur, Bharath Rangarajan, Bhanwar Singh, Kathleen R. Early | 2001-03-06 |
| 6187666 | CVD plasma process to fill contact hole in damascene process | Bhanwar Singh, Bharath Rangarajan, Christopher F. Lyons, Sanjay K. Yedur, Ramkumar Subramanian | 2001-02-13 |
| 6183938 | Conformal organic coatings for sidewall patterning of sublithographic structures | Christopher F. Lyons | 2001-02-06 |
| 6117618 | Carbonized antireflective coating produced by spin-on polymer material | Sanjay K. Yedur, Bhanwar Singh, Bharath Rangarajan | 2000-09-12 |
| 6110833 | Elimination of oxynitride (ONO) etch residue and polysilicon stringers through isolation of floating gates on adjacent bitlines by polysilicon oxidation | Kathleen R. Early, Nicholas H. Tripsas, Maria C. Chan | 2000-08-29 |
| 6093650 | Method for fully planarized conductive line for a stack gate | Tuan Pham | 2000-07-25 |
| 6093967 | Self-aligned silicide contacts formed from deposited silicon | Yowjuang W. Liu, Mark S. Chang | 2000-07-25 |
| 6066530 | Oxygen implant self-aligned, floating gate and isolation structure | Kathleen R. Early | 2000-05-23 |
| 6043120 | Elimination of oxynitride (ONO) etch residue and polysilicon stringers through isolation of floating gates on adjacent bitlines by polysilicon oxidation | Kathleen R. Early, Nicholas H. Tripsas, Maria C. Chan | 2000-03-28 |
| 6034771 | System for uniformly heating photoresist | Bharath Rangarajan, Bhanwar Singh, Sanjay K. Yedur | 2000-03-07 |
| 6030868 | Elimination of oxynitride (ONO) etch residue and polysilicon stringers through isolation of floating gates on adjacent bitlines by polysilicon oxidation | Kathleen R. Early, Nicholas H. Tripsas, Maria C. Chan, Mark T. Ramsbey | 2000-02-29 |
| 5920786 | Method for fabricating shallow isolation trenches using angular photoresist profiles to create sloped isolation trench walls | Tuan Pham | 1999-07-06 |
| 5658440 | Surface image transfer etching | Subhash Gupta | 1997-08-19 |
| 5308740 | Electrical measurement of sidewall angle | Subhash Gupta | 1994-05-03 |
| 5128230 | Quinone diazide containing photoresist composition utilizing mixed solvent of ethyl lactate, anisole and amyl acetate | Anthony Zampini, Peter Trefonas, III, James C. Woodbrey, David C. Madoux, Brian K. Daniels | 1992-07-07 |