BR

Bharath Rangarajan

AM AMD: 177 patents #8 of 9,279Top 1%
MO Motivo: 4 patents #3 of 7Top 45%
Globalfoundries: 3 patents #1,029 of 4,424Top 25%
TB Target Brands: 3 patents #366 of 1,696Top 25%
Fujitsu Limited: 2 patents #10,930 of 24,456Top 45%
MU Michigan State University: 1 patents #51 of 212Top 25%
📍 Sunnyvale, CA: #20 of 14,302 inventorsTop 1%
🗺 California: #614 of 386,348 inventorsTop 1%
Overall (All Time): #3,769 of 4,157,543Top 1%
190
Patents All Time

Issued Patents All Time

Showing 176–190 of 190 patents

Patent #TitleCo-InventorsDate
6196734 CD uniformity by active control of developer temperature Michael K. Templeton 2001-03-06
6191036 Use of photoresist focus exposure matrix array as via etch monitor Allen S. Yu, Paul J. Steffan 2001-02-20
6190062 Cleaning chamber built into SEM for plasma or gaseous phase cleaning Ramkumar Subramanian, Khoi A. Phan, Bhanwar Singh, Bryan K. Choo, Sanjay K. Yedur 2001-02-20
6191046 Deposition of an oxide layer to facilitate photoresist rework on polygate layer Bhanwar Singh, Sanjay K. Yedur 2001-02-20
6187666 CVD plasma process to fill contact hole in damascene process Bhanwar Singh, Michael K. Templeton, Christopher F. Lyons, Sanjay K. Yedur, Ramkumar Subramanian 2001-02-13
6168993 Process for fabricating a semiconductor device having a graded junction David K. Foote, George J. Kluth, Fei Wang 2001-01-02
6153504 Method of using a silicon oxynitride ARC for final metal layer Jeffrey A. Shields 2000-11-28
6136514 Resist developer saving system using material to reduce surface tension and wet resist surface Khoi A. Phan, Ramkumar Subramanian, Bhanwar Singh 2000-10-24
6127259 Phosphoric acid process for removal of contact BARC layer Jeffrey A. Shields 2000-10-03
6117618 Carbonized antireflective coating produced by spin-on polymer material Sanjay K. Yedur, Bhanwar Singh, Michael K. Templeton 2000-09-12
6099783 Photopolymerizable compositions for encapsulating microelectronic devices Alec B. Scranton, Kiran Baikerikar 2000-08-08
6063531 Focus monitor structure and method for lithography process Bhanwar Singh, Khoi A. Phan, Carmen Morales 2000-05-16
6057914 Method for detecting and identifying a lens aberration by measurement of sidewall angles by atomic force microscopy Sanjay K. Yedur, Bhanwar Singh 2000-05-02
6034771 System for uniformly heating photoresist Bhanwar Singh, Sanjay K. Yedur, Michael K. Templeton 2000-03-07
5855837 Thick, composite parts made from photopolymerizable compositions and methods for making such parts Alec B. Scranton, Lindsay S. Coons 1999-01-05