Issued Patents 2023
Showing 1–12 of 12 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 11830732 | Selective passivation and selective deposition | Jan Willem Maes, Michael Eugene Givens, Vamsi K. Paruchuri, Ivo Raaijmakers, Shaoren Deng +4 more | 2023-11-28 |
| 11739428 | Thermal atomic layer etching processes | Tom E. Blomberg, Varun Sharma, Marko Tuominen, Chiyu Zhu | 2023-08-29 |
| 11739427 | Thermal atomic layer etching processes | Tom E. Blomberg, Varun Sharma, Marko Tuominen, Chiyu Zhu | 2023-08-29 |
| 11728164 | Selective PEALD of oxide on dielectric | Eva Tois, Viljami Pore, Toshiya Suzuki, Lingyun Jia, Sun Ja Kim +1 more | 2023-08-15 |
| 11728175 | Deposition of organic films | Eva Tois, Hidemi Suemori, Viljami Pore, Varun Sharma, Jan Willem Maes +2 more | 2023-08-15 |
| 11649546 | Organic reactants for atomic layer deposition | Antti Niskanen, Eva Tois, Hidemi Suemori | 2023-05-16 |
| 11646194 | Methods for forming silicon nitride thin films | Antti Niskanen, Jaakko Anttila | 2023-05-09 |
| 11640899 | Atomic layer etching processes | Tom E. Blomberg, Varun Sharma, Marko Tuominen, Chiyu Zhu | 2023-05-02 |
| 11610775 | Method and apparatus for filling a gap | Viljami Pore, Werner Knaepen, Bert Jongbloed, Dieter Pierreux, Steven R. A. Van Aerde +2 more | 2023-03-21 |
| 11608557 | Simultaneous selective deposition of two different materials on two different surfaces | Michael Eugene Givens, Eva Tois, Daria Nevstrueva, Charles Dezelah | 2023-03-21 |
| 11587783 | Si precursors for deposition of SiN at low temperatures | Antti Niskanen, Shang Chen, Viljami Pore, Atsuki Fukazawa, Hideaki Fukuda | 2023-02-21 |
| 11555242 | Precursors and methods for atomic layer deposition of transition metal oxides | Timo Hatanpää, Jaakko Niinisto, Mikko Ritala, Markku Leskelä | 2023-01-17 |