Issued Patents 2023
Showing 1–7 of 7 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 11676812 | Method for forming silicon nitride film selectively on top/bottom portions | Dai Ishikawa, Eiichiro Shiba, Shinya Ueda, Taishi Ebisudani, SeungJu Chun +4 more | 2023-06-13 |
| 11646197 | Method for depositing silicon-free carbon-containing film as gap-fill layer by pulse plasma-assisted deposition | Timothee Blanquart, Mitsuya Utsuno, Yoshio Susa, Toshio Nakanishi | 2023-05-09 |
| 11637011 | Method of topology-selective film formation of silicon oxide | Masaru Zaitsu, Pei-Chia Chen | 2023-04-25 |
| 11626316 | Method of depositing carbon-containing material on a surface of a substrate, structure formed using the method, and system for forming the structure | Mitsuya Utsuno, Yan Zhang, Yoshio Susa | 2023-04-11 |
| 11610775 | Method and apparatus for filling a gap | Viljami Pore, Werner Knaepen, Bert Jongbloed, Dieter Pierreux, Steven R. A. Van Aerde +2 more | 2023-03-21 |
| 11610774 | Methods for forming a topographically selective silicon oxide film by a cyclical plasma-enhanced deposition process | Aurélie Kuroda | 2023-03-21 |
| 11587783 | Si precursors for deposition of SiN at low temperatures | Antti Niskanen, Shang Chen, Viljami Pore, Hideaki Fukuda, Suvi Haukka | 2023-02-21 |