Issued Patents 2023
Showing 1–13 of 13 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 11848176 | Plasma processing using pulsed-voltage and radio-frequency power | Leonid Dorf, Rajinder Dhindsa, James Rogers, Daniel Sang Byun, Evgeny Kamenetskiy +3 more | 2023-12-19 |
| 11823868 | Hardware switch on main feed line in a radio frequency plasma processing chamber | Yue Guo, Yang Yang | 2023-11-21 |
| 11814724 | Continuous liner for use in a processing chamber | James D. Carducci, Kenneth S. Collins | 2023-11-14 |
| 11810760 | Apparatus and method of ion current compensation | Yang Yang, Yue Guo | 2023-11-07 |
| 11784042 | Carbon hard masks for patterning applications and methods related thereto | Eswaranand Venkatasubramanian, Yang Yang, Pramit Manna, Takehito Koshizawa, Abhijit Basu Mallick | 2023-10-10 |
| 11776788 | Pulsed voltage boost for substrate processing | Yang Yang, Yue Guo | 2023-10-03 |
| 11776789 | Plasma processing assembly using pulsed-voltage and radio-frequency power | Leonid Dorf, Rajinder Dhindsa, James Rogers, Daniel Sang Byun, Evgeny Kamenetskiy +4 more | 2023-10-03 |
| 11749505 | Methods and apparatus for processing a substrate | John Poulose | 2023-09-05 |
| 11735486 | Process monitor device having a plurality of sensors arranged in concentric circles | Leonard Tedeschi | 2023-08-22 |
| 11721525 | Sensorless RF impedance matching network | Yue Guo, Yang Yang | 2023-08-08 |
| 11651966 | Methods and apparatus for processing a substrate | Yang Yang, Kenneth S. Collins, Steven Lane, Gonzalo Monroy, Yue Guo | 2023-05-16 |
| 11603591 | Pulsed plasma (DC/RF) deposition of high quality C films for patterning | Eswaranand Venkatasubramanian, Yang Yang, Pramit Manna, Takehito Koshizawa, Abhijit Basu Mallick | 2023-03-14 |
| 11587766 | Symmetric VHF source for a plasma reactor | Igor Markovsky, Zhigang Chen, James D. Carducci, Kenneth S. Collins, Shahid Rauf +3 more | 2023-02-21 |