| 11848176 |
Plasma processing using pulsed-voltage and radio-frequency power |
Leonid Dorf, Rajinder Dhindsa, Daniel Sang Byun, Evgeny Kamenetskiy, Yue Guo +3 more |
2023-12-19 |
| 11810768 |
Temperature and bias control of edge ring |
Linying Cui, Rajinder Dhindsa |
2023-11-07 |
| 11798790 |
Apparatus and methods for controlling ion energy distribution |
Linying Cui |
2023-10-24 |
| 11791138 |
Automatic electrostatic chuck bias compensation during plasma processing |
Linying Cui, Leonid Dorf |
2023-10-17 |
| 11776789 |
Plasma processing assembly using pulsed-voltage and radio-frequency power |
Leonid Dorf, Rajinder Dhindsa, Daniel Sang Byun, Evgeny Kamenetskiy, Yue Guo +4 more |
2023-10-03 |
| 11728124 |
Creating ion energy distribution functions (IEDF) |
Leonid Dorf, Travis Koh, Olivier Luere, Olivier Joubert, Philip Allan Kraus +1 more |
2023-08-15 |
| 11699572 |
Feedback loop for controlling a pulsed voltage waveform |
Leonid Dorf, Evgeny Kamenetskiy, Olivier Luere, Rajinder Dhindsa, Viacheslav Plotnikov |
2023-07-11 |
| 11694876 |
Apparatus and method for delivering a plurality of waveform signals during plasma processing |
Katsumasa Kawasaki |
2023-07-04 |
| 11610759 |
Gas splitting by time average injection into different zones by fast gas valves |
— |
2023-03-21 |
| 11551916 |
Sheath and temperature control of a process kit in a substrate processing chamber |
Jaeyong Cho, Rajinder Dhindsa, Anwar Husain |
2023-01-10 |
