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Hardware switch on main feed line in a radio frequency plasma processing chamber |
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Apparatus and method of ion current compensation |
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Carbon hard masks for patterning applications and methods related thereto |
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Pulsed voltage boost for substrate processing |
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| 11721525 |
Sensorless RF impedance matching network |
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Methods and apparatus for processing a substrate |
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Determining properties of a subterranean formation using an acoustic wave equation with a reflectivity parameterization |
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Pulsed plasma (DC/RF) deposition of high quality C films for patterning |
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2023-03-14 |
