| 11133155 |
Apparatus for depositing metal films with plasma treatment |
Daping Yao, Hyman Lam, John C. Forster, Jiang Lu, Can Xu +2 more |
2021-09-28 |
| 11049722 |
Methods and materials for modifying the threshold voltage of metal oxide stacks |
Siddarth A. Krishnan, Rajesh Sathiyanarayanan, Atashi Basu |
2021-06-29 |
| 11033930 |
Methods and apparatus for cryogenic gas stream assisted SAM-based selective deposition |
Chang Ke, Song-Moon Suh, Liqi Wu, Michael S. Jackson, Lei Zhou +3 more |
2021-06-15 |
| 11018009 |
Tuning work function of p-metal work function films through vapor deposition |
Guoqiang Jian, Wei V. Tang, Chi-Chou Lin, Yixiong Yang, Mei Chang +1 more |
2021-05-25 |
| 10982326 |
Counter-flow multi inject for atomic layer deposition chamber |
Dien-Yeh Wu, Guodan Wei, Chun-Teh Kao |
2021-04-20 |
| 10950433 |
Methods for enhancing selectivity in SAM-based selective deposition |
Chang Ke, Michael S. Jackson, Liqi Wu, Lei Zhou, Shuyi Zhang +3 more |
2021-03-16 |
| 10930472 |
Methods for forming a metal silicide interconnection nanowire structure |
Bencherki Mebarki, Annamalai Lakshmanan, Kaushal K. Singh, Andrew Cockburn, Ludovic Godet +1 more |
2021-02-23 |
| 10910263 |
Doping control of metal nitride films |
Annamalai Lakshmanan, Ben-Li Sheu, Guodan Wei, Nicole Lundy |
2021-02-02 |
