Issued Patents 2021
Showing 1–4 of 4 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 11075276 | Methods and apparatus for n-type metal oxide semiconductor (NMOS) metal gate materials using atomic layer deposition (ALD) processes with metal based precursors | Yongjing Lin, Shih Chung Chen, Naomi Yoshida, Lin Dong, Rongjun Wang +5 more | 2021-07-27 |
| 11033930 | Methods and apparatus for cryogenic gas stream assisted SAM-based selective deposition | Chang Ke, Song-Moon Suh, Michael S. Jackson, Lei Zhou, Biao Liu +3 more | 2021-06-15 |
| 10957590 | Method for forming a layer | Wenhui Wang, Huixiong Dai, Christopher S. Ngai, Wenyu Zhang, Yongmei Chen +3 more | 2021-03-23 |
| 10950433 | Methods for enhancing selectivity in SAM-based selective deposition | Chang Ke, Michael S. Jackson, Lei Zhou, Shuyi Zhang, David Thompson +3 more | 2021-03-16 |