Issued Patents 2021
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 11145761 | Horizontal gate all around and FinFET device isolation | Shiyu Sun, Theresa Kramer Guarini, Sung Won Jun, Vanessa Pena, Errol Antonio C. Sanchez +4 more | 2021-10-12 |
| 11075276 | Methods and apparatus for n-type metal oxide semiconductor (NMOS) metal gate materials using atomic layer deposition (ALD) processes with metal based precursors | Yongjing Lin, Shih Chung Chen, Lin Dong, Liqi Wu, Rongjun Wang +5 more | 2021-07-27 |