Issued Patents 2021
Showing 1–4 of 4 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 11171047 | Fluorine-doped nitride films for improved high-k reliability | Yixiong Yang, Srinivas Gandikota, Steven C. H. Hung, Jacqueline S. Wrench, Yongjing Lin +2 more | 2021-11-09 |
| 11075276 | Methods and apparatus for n-type metal oxide semiconductor (NMOS) metal gate materials using atomic layer deposition (ALD) processes with metal based precursors | Yongjing Lin, Shih Chung Chen, Naomi Yoshida, Lin Dong, Liqi Wu +5 more | 2021-07-27 |
| 11018009 | Tuning work function of p-metal work function films through vapor deposition | Guoqiang Jian, Chi-Chou Lin, Paul F. Ma, Yixiong Yang, Mei Chang +1 more | 2021-05-25 |
| 10991586 | In-situ tungsten deposition without barrier layer | Yong Wu, Jianqiu GUO, Wenyi Liu, Yixiong Yang, Jacqueline S. Wrench +3 more | 2021-04-27 |