Issued Patents 2021
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 11189479 | Diffusion barrier layer | Benjamin Colombeau, Johanes F. Swenberg | 2021-11-30 |
| 11171047 | Fluorine-doped nitride films for improved high-k reliability | Yixiong Yang, Srinivas Gandikota, Jacqueline S. Wrench, Yongjing Lin, Susmit Singha Roy +2 more | 2021-11-09 |
| 11075276 | Methods and apparatus for n-type metal oxide semiconductor (NMOS) metal gate materials using atomic layer deposition (ALD) processes with metal based precursors | Yongjing Lin, Shih Chung Chen, Naomi Yoshida, Lin Dong, Liqi Wu +5 more | 2021-07-27 |
| 11062900 | Method of reducing effective oxide thickness in a semiconductor structure | Luping Li, Shih Chung Chen, Kazuya Daito, Lin Dong, Zhebo Chen +1 more | 2021-07-13 |