| 10829855 |
Gas distribution showerhead for semiconductor processing |
Anh N. Nguyen, Mehmet Tugrul Samir |
2020-11-10 |
| 10796922 |
Systems and methods for internal surface conditioning assessment in plasma processing equipment |
Soonam Park, Yufei Zhu, Edwin C. Suarez, Nitin K. Ingle, Jiayin Huang |
2020-10-06 |
| 10755900 |
Multi-layer plasma erosion protection for chamber components |
Toan Q. Tran, Laksheswar Kalita, Tae Won Kim, Xiaowei Wu, Xiao-Ming He +2 more |
2020-08-25 |
| 10707061 |
Systems and methods for internal surface conditioning in plasma processing equipment |
Soonam Park, Yufei Zhu, Edwin C. Suarez, Nitin K. Ingle, Jiayin Huang |
2020-07-07 |
| 10699879 |
Two piece electrode assembly with gap for plasma control |
Tien Fak Tan, Saravjeet Singh, Tae Wan Kim, Kenneth D. Schatz, Tae Seung Cho +1 more |
2020-06-30 |
| 10625277 |
Showerhead having a detachable gas distribution plate |
Vladimir Knyazik, Hamid Noorbakhsh, Jason C. Della Rosa, Zheng John Ye, Jennifer Y. Sun +1 more |
2020-04-21 |
| 10607867 |
Bolted wafer chuck thermal management systems and methods for wafer processing systems |
David Benjaminson, Ananda Seelavanth Math, Saravanakumar Natarajan, Shubham Chourey |
2020-03-31 |
| 10593523 |
Systems and methods for internal surface conditioning in plasma processing equipment |
Soonam Park, Yufei Zhu, Edwin C. Suarez, Nitin K. Ingle, Jiayin Huang |
2020-03-17 |
| 10593560 |
Magnetic induction plasma source for semiconductor processes and equipment |
Tae Seung Cho, Soonwook Jung, Junghoon Kim, Satoru Kobayashi, Kenneth D. Schatz +1 more |
2020-03-17 |
| 10577690 |
Gas distribution showerhead for semiconductor processing |
Anh N. Nguyen, Mehmet Tugrul Samir |
2020-03-03 |
| 10573496 |
Direct outlet toroidal plasma source |
— |
2020-02-25 |
| 10559451 |
Apparatus with concentric pumping for multiple pressure regimes |
Nikolai Kalnin, Toan Q. Tran |
2020-02-11 |
| 10551328 |
Ceramic ring test device |
Satoru Kobayashi, Yufei Zhu, Saurabh Garg, Soonam Park |
2020-02-04 |
| 10550472 |
Flow control features of CVD chambers |
Kien N. Chuc, Qiwei Liang, Hanh Nguyen, Xinglong Chen, Matthew L. Miller +5 more |
2020-02-04 |
| 10546729 |
Dual-channel showerhead with improved profile |
— |
2020-01-28 |
| 10541113 |
Chamber with flow-through source |
— |
2020-01-21 |
| 10541184 |
Optical emission spectroscopic techniques for monitoring etching |
Soonwook Jung, Soonam Park |
2020-01-21 |
