TB

Tien-I Bao

TSMC: 17 patents #53 of 3,065Top 2%
Overall (2019): #2,685 of 560,194Top 1%
17
Patents 2019

Issued Patents 2019

Showing 1–17 of 17 patents

Patent #TitleCo-InventorsDate
10515823 Via connection to a partially filled trench Shih-Ming Chang, Chih-Ming Lai, Ru-Gun Liu, Tsai-Sheng Gau, Chung-Ju Lee +1 more 2019-12-24
10505018 Spacers with rectangular profile and methods of forming the same Yu-Sheng Chang, Chung-Ju Lee 2019-12-10
10490650 Low-k gate spacer and methods for forming the same Wen-Kai Lin, Bo-Yu Lai, Li Chun Te, Kai-Hsuan Lee, Sai-Hooi Yeong +1 more 2019-11-26
10483169 FinFET cut-last process using oxide trench fill Yen-Chun Huang, Chih-Tang Peng, Kuang-Yuan Hsu, Tai-Chun Huang, Tsu-Hsiu Perng 2019-11-19
10408998 Method of fabrication polymer waveguide Chun-Hao Tseng, Wan-Yu Lee, Hai-Ching Chen 2019-09-10
10353147 Etchant and etching process for substrate of a semiconductor device Wan-Yu Lee, Ying-Hao Kuo, Hai-Ching Chen 2019-07-16
10354954 Copper etching integration scheme Chih Wei Lu, Chung-Ju Lee, Hsiang-Huan Lee 2019-07-16
10332838 Schemes for forming barrier layers for copper in interconnect structures Chen-Hua Yu, Hai-Ching Chen 2019-06-25
10312139 Interconnect structure having an etch stop layer over conductive lines Cheng-Hsiung Tsai, Chung-Ju Lee, Shau-Lin Shue 2019-06-04
10312136 Etch damage and ESL free dual damascene metal interconnect Sunil Kumar Singh, Chung-Ju Lee 2019-06-04
10290536 Structure and method for interconnection Chih Wei Lu, Chung-Ju Lee 2019-05-14
10269757 Integrated circuit with a thermally conductive underfill and methods of forming same Chen-Hua Yu 2019-04-23
10269634 Semiconductor device having voids and method of forming same Yung-Hsu Wu, Chien-Hua Huang, Chung-Ju Lee, Shau-Lin Shue 2019-04-23
10269567 Multi-layer mask and method of forming same Teng-Chun Tsai, Yung-Cheng Lu, Ying-Tsung Chen 2019-04-23
10261248 Package structure and methods of forming same Jui Hsieh Lai, Ying-Hao Kuo, Hai-Ching Chen 2019-04-16
10180547 Optical bench on substrate Wan-Yu Lee, Chun-Hao Tseng, Hai-Ching Chen 2019-01-15
10170306 Method of double patterning lithography process using plurality of mandrels for integrated circuit applications Chung-Ju Lee, Hsin-Chieh Yao, Shau-Lin Shue, Yung-Hsu Wu 2019-01-01