Issued Patents 2019
Showing 1–20 of 20 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 10460951 | Gas reaction trajectory control through tunable plasma dissociation for wafer by-product distribution and etch feature profile uniformity | Saravanapriyan Sriraman, Monica Titus | 2019-10-29 |
| 10431434 | Powered grid for plasma chamber | Maolin Long, Richard A. Marsh, Ying Wu | 2019-10-01 |
| 10431426 | Gas plenum arrangement for improving etch non-uniformity in transformer-coupled plasma systems | Tom A. Kamp, Arthur H. Sato | 2019-10-01 |
| 10427307 | Automated replacement of consumable parts using end effectors interfacing with plasma processing system | Damon Tyrone Genetti, Jon McChesney, Derek John Witkowicki, Austin Ngo | 2019-10-01 |
| 10424461 | Controlling ion energy within a plasma chamber | Thorsten Lill, Harmeet Singh, Gowri Kamarthy | 2019-09-24 |
| 10410832 | Control of on-wafer CD uniformity with movable edge ring and gas injection adjustment | Yiting Zhang, Saravanapriyan Sriraman | 2019-09-10 |
| 10395894 | Systems and methods for achieving peak ion energy enhancement with a low angular spread | Juline Shoeb, Ying Wu | 2019-08-27 |
| 10386828 | Methods and apparatuses for etch profile matching by surface kinetic model optimization | Mehmet Derya Tetiker, Saravanapriyan Sriraman, Andrew D. Bailey, III, Juline Shoeb, Richard A. Gottscho | 2019-08-20 |
| 10366865 | Gas distribution system for ceramic showerhead of plasma etch reactor | Michael Kang | 2019-07-30 |
| 10340121 | Plasma processing systems including side coils and methods related to the plasma processing systems | Maolin Long | 2019-07-02 |
| 10332725 | Systems and methods for reversing RF current polarity at one output of a multiple output RF matching network | Arthur H. Sato, Maolin Long | 2019-06-25 |
| 10304717 | Automated replacement of consumable parts using interfacing chambers | Damon Tyrone Genetti, Jon McChesney, Derek John Witkowicki, Austin Ngo | 2019-05-28 |
| 10304660 | Multi-level pulsing of DC and RF signals | Juline Shoeb, Ying Wu | 2019-05-28 |
| 10303830 | Methods and apparatuses for etch profile optimization by reflectance spectra matching and surface kinetic model optimization | Mehmet Derya Tetiker, Saravanapriyan Sriraman, Andrew D. Bailey, III, Richard A. Gottscho | 2019-05-28 |
| 10264663 | Matchless plasma source for semiconductor wafer fabrication | Maolin Long, Yuhou Wang, Ricky Marsh | 2019-04-16 |
| 10242845 | Near-substrate supplemental plasma density generation with low bias voltage within inductively coupled plasma processing chamber | Zhongkui Tan, Yiting Zhang, Qian Fu, Qing Xu, Ying Wu +1 more | 2019-03-26 |
| 10242844 | Rotating RF electric field antenna for uniform plasma generation | Jon McChesney | 2019-03-26 |
| 10224183 | Multi-level parameter and frequency pulsing with a low angular spread | Juline Shoeb, Ying Wu | 2019-03-05 |
| 10224221 | Internal plasma grid for semiconductor fabrication | Harmeet Singh, Thorsten Lill, Vahid Vahedi, Monica Titus, Gowri Kamarthy | 2019-03-05 |
| 10197908 | Photoresist design layout pattern proximity correction through fast edge placement error prediction via a physics-based etch profile modeling framework | Saravanapriyan Sriraman, Richard Wise, Harmeet Singh, Andrew D. Bailey, III, Vahid Vahedi +1 more | 2019-02-05 |