Issued Patents 2019
Showing 1–13 of 13 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 10515816 | Integrating atomic scale processes: ALD (atomic layer deposition) and ALE (atomic layer etch) | Keren Jacobs Kanarik, Jeffrey Marks, Samantha Tan, Alexander Kabansky, Wenbing Yang +3 more | 2019-12-24 |
| 10497544 | Component of a plasma processing apparatus having a protective in situ formed layer on a plasma exposed surface | Thorsten Lill | 2019-12-03 |
| 10424461 | Controlling ion energy within a plasma chamber | Thorsten Lill, Alex Paterson, Gowri Kamarthy | 2019-09-24 |
| 10403475 | Tunable multi-zone gas injection system | David Cooperberg, Vahid Vahedi, Douglas Ratto, Neil Benjamin | 2019-09-03 |
| 10388493 | Component of a substrate support assembly producing localized magnetic fields | Keith Gaff, Brett C. Richardson, Sung Lee | 2019-08-20 |
| 10372045 | Method of calibrating a reluctance actuator assembly, reluctance actuator and lithographic apparatus comprising such reluctance actuator | Johannes Antonius Gerardus Akkermans, Bas Pieter Lemmen, Sjoerd Martijn Huiberts, Joeri Lof, Petrus Theodorus Rutgers +2 more | 2019-08-06 |
| 10256077 | Sub-pulsing during a state | John C. Valcore, Jr., Bradford J. Lyndaker | 2019-04-09 |
| 10242883 | High aspect ratio etch of oxide metal oxide metal stack | Joydeep Guha, Sirish Reddy, Kaushik Chattopadhyay, Thomas W. Mountsier, Aaron Eppler +2 more | 2019-03-26 |
| 10236193 | Substrate supports with multi-layer structure including independent operated heater zones | Keith Gaff, Neil Benjamin, Keith Comendant | 2019-03-19 |
| 10224221 | Internal plasma grid for semiconductor fabrication | Thorsten Lill, Vahid Vahedi, Alex Paterson, Monica Titus, Gowri Kamarthy | 2019-03-05 |
| 10217615 | Plasma processing apparatus and component thereof including an optical fiber for determining a temperature thereof | — | 2019-02-26 |
| 10197908 | Photoresist design layout pattern proximity correction through fast edge placement error prediction via a physics-based etch profile modeling framework | Saravanapriyan Sriraman, Richard Wise, Alex Paterson, Andrew D. Bailey, III, Vahid Vahedi +1 more | 2019-02-05 |
| 10186426 | Integrating atomic scale processes: ALD (atomic layer deposition) and ale (atomic layer etch) | Keren Jacobs Kanarik, Jeffrey Marks, Samantha Tan, Alexander Kabansky, Wenbing Yang +3 more | 2019-01-22 |