Issued Patents 2019
Showing 1–9 of 9 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 10460951 | Gas reaction trajectory control through tunable plasma dissociation for wafer by-product distribution and etch feature profile uniformity | Monica Titus, Alex Paterson | 2019-10-29 |
| 10410832 | Control of on-wafer CD uniformity with movable edge ring and gas injection adjustment | Yiting Zhang, Alex Paterson | 2019-09-10 |
| 10386828 | Methods and apparatuses for etch profile matching by surface kinetic model optimization | Mehmet Derya Tetiker, Andrew D. Bailey, III, Juline Shoeb, Alex Paterson, Richard A. Gottscho | 2019-08-20 |
| 10303830 | Methods and apparatuses for etch profile optimization by reflectance spectra matching and surface kinetic model optimization | Mehmet Derya Tetiker, Andrew D. Bailey, III, Alex Paterson, Richard A. Gottscho | 2019-05-28 |
| 10262867 | Fast-gas switching for etching | Alexander Paterson | 2019-04-16 |
| 10254641 | Layout pattern proximity correction through fast edge placement error prediction | Julien Mailfert, Mehmet Derya Tetiker | 2019-04-09 |
| 10249511 | Ceramic showerhead including central gas injector for tunable convective-diffusive gas flow in semiconductor substrate processing apparatus | Alexander Paterson | 2019-04-02 |
| 10242845 | Near-substrate supplemental plasma density generation with low bias voltage within inductively coupled plasma processing chamber | Zhongkui Tan, Yiting Zhang, Qian Fu, Qing Xu, Ying Wu +1 more | 2019-03-26 |
| 10197908 | Photoresist design layout pattern proximity correction through fast edge placement error prediction via a physics-based etch profile modeling framework | Richard Wise, Harmeet Singh, Alex Paterson, Andrew D. Bailey, III, Vahid Vahedi +1 more | 2019-02-05 |