Issued Patents 2018
Showing 1–11 of 11 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 10163885 | Systems and methods for a sequential spacer scheme | Shih-Ming Chang, Ming-Feng Shieh, Ru-Gun Liu | 2018-12-25 |
| 10163654 | Method of fabricating semiconductor device with reduced trench distortions | Yung-Sung Yen, Chung-Ju Lee, Chun-Kuang Chen, Chia-Tien Wu, Ta-Ching Yu +4 more | 2018-12-25 |
| 10153166 | Mechanisms for forming patterns using lithography processes | Shih-Ming Chang, Ming-Feng Shieh, Chih-Ming Lai, Ru-Gun Liu | 2018-12-11 |
| 10146141 | Lithography process and system with enhanced overlay quality | Chi-Cheng Hung, Wei-Liang Lin, Yung-Sung Yen, Chun-Kuang Chen, Ru-Gun Liu +6 more | 2018-12-04 |
| 10049918 | Directional patterning methods | Chi-Cheng Hung, Ru-Gun Liu, Wei-Liang Lin, Ta-Ching Yu, Yung-Sung Yen +3 more | 2018-08-14 |
| 10032664 | Methods for patterning a target layer through fosse trenches using reverse sacrificial spacer lithography | Shih-Ming Chang, Ken-Hsien Hsieh, Chih-Ming Lai, Ming-Feng Shieh, Ru-Gun Liu | 2018-07-24 |
| 10014175 | Lithography using high selectivity spacers for pitch reduction | Yu-Sheng Chang, Cheng-Hsiung Tsai, Chung-Ju Lee, Hai-Ching Chen, Hsiang-Huan Lee +5 more | 2018-07-03 |
| 9991132 | Lithographic technique incorporating varied pattern materials | Chin-Yuan Tseng, Chi-Cheng Hung, Chun-Kuang Chen, De-Fang Chen, Ru-Gun Liu +1 more | 2018-06-05 |
| 9983473 | Photomask and method for fabricating integrated circuit | Chun Lin, Yi-Jie Chen, Feng-Yuan Chiu, Ying-Chou Cheng, Kuei-Liang Lu +2 more | 2018-05-29 |
| 9911606 | Mandrel spacer patterning in multi-pitch integrated circuit manufacturing | Chia-Ping Chiang, Ya-Ting Chang, Wen-Li Cheng, Nian-Fuh Cheng, Ming-Hui Chih +2 more | 2018-03-06 |
| 9911623 | Via connection to a partially filled trench | Shih-Ming Chang, Chih-Ming Lai, Ru-Gun Liu, Chung-Ju Lee, Tien-I Bao +1 more | 2018-03-06 |